发明授权
- 专利标题: Method of determining and correcting processing state of photosensitive material based on mahalanobis calculation
- 专利标题(中): 基于马哈拉诺比斯计算确定和校正感光材料的处理状态的方法
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申请号: US328592申请日: 1999-06-10
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公开(公告)号: US06117601A公开(公告)日: 2000-09-12
- 发明人: Yukihiko Kanazawa , Shinzo Kishimoto , Jun Okamoto , Yoshio Ishii , Yoshihiro Fujita
- 申请人: Yukihiko Kanazawa , Shinzo Kishimoto , Jun Okamoto , Yoshio Ishii , Yoshihiro Fujita
- 申请人地址: JPX Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX10-350447 19981209; JPX10-373197 19981228
- 主分类号: G03D13/00
- IPC分类号: G03D13/00 ; G05B23/02 ; G03F9/00
摘要:
The state of a photosensitive material processing solution is easily determined from values of multi-dimensional analysis by utilizing Mahalanobis distance. The Mahalanobis distance is calculated, and a determination is made as to whether or not the Mahalanobis distance is greater than or equal to a threshold value. If the Mahalanobis distance is less than the threshold value, the processing solution is determined to be normal, the Mahalanobis distance is displayed on a display unit, and a determination is made as to whether or not the number of sets m of normal values has become greater than or equal to a predetermined value m.sub.0. If m.gtoreq.m.sub.0, data of the characteristic values in the oldest set in a time series is deleted, and a set of data of newly detected characteristic values is added to calculate the Mahalanobis distance and update a database. If the Mahalanobis distance is greater than or equal to the predetermined value, a developing solution is determined to have become abnormal, the degree of abnormality is displayed, factors which caused the abnormality are determined, a corrective measure is determined on the basis of a combination pattern of factors, and the measure is displayed.
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