发明授权
US6118516A Projection exposure apparatus having a filter arranged in its projection
optical system and method for protecting circuit patterns
失效
具有布置在其投影光学系统中的滤光器的投影曝光设备和用于保护电路图案的方法
- 专利标题: Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns
- 专利标题(中): 具有布置在其投影光学系统中的滤光器的投影曝光设备和用于保护电路图案的方法
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申请号: US826063申请日: 1997-03-24
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公开(公告)号: US6118516A公开(公告)日: 2000-09-12
- 发明人: Nobuyuki Irie , Nobutaka Magome , Yasuaki Tanaka , Naomasa Shiraishi , Shigeru Hirukawa
- 申请人: Nobuyuki Irie , Nobutaka Magome , Yasuaki Tanaka , Naomasa Shiraishi , Shigeru Hirukawa
- 申请人地址: JPX Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX6-032224 19940302; JPX6-084476 19940422; JPX6-112431 19940526; JPX6-132896 19940615
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03F9/00 ; G03B27/42
摘要:
A projection exposure apparatus which can perform superior observation or projection of a selected mark when the mark is observed or projected through a projection optical system in which a pupil filter is set. The projection exposure apparatus which projects a pattern on a mask through a projection optical system onto a photosensitive substrate held on a substrate stage movable in a plane perpendicular to the optical axis of the projection optical system and which has a pupil filter (optical correction plate) placed on or near the pupil plane of the projection optical system, a reference mark formed on the substrate stage in a scale factor according to the shape of the pupil filter, illuminating means for illuminating the reference mark with illumination light, and light-receiving means for receiving the illumination light having emerged from the reference mark and thereafter having passed the projection optical system.