发明授权
- 专利标题: Overcoat material as protecting layer for image recording materials
- 专利标题(中): 外涂层材料作为图像记录材料的保护层
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申请号: US354055申请日: 1999-07-15
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公开(公告)号: US6130014A公开(公告)日: 2000-10-10
- 发明人: Hwei-Ling Yau , Tienteh Chen , David E. Decker , Stephan L. Twist , Kevin M. O'Connor
- 申请人: Hwei-Ling Yau , Tienteh Chen , David E. Decker , Stephan L. Twist , Kevin M. O'Connor
- 申请人地址: NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: NY Rochester
- 主分类号: B41M5/00
- IPC分类号: B41M5/00 ; B41M7/00 ; C09D5/00 ; C09D157/06 ; G03C1/053 ; G03C1/76 ; G03C1/85 ; G03C5/14 ; G03C11/08
摘要:
The present invention is a coating composition comprising at least one first water insoluble polymer having a Tg equal to or less than 30.degree. C. and at least one second water insoluble polymer having a Tg equal to or greater than 60.degree. C. wherein the first polymer comprises a monomer at a weight percent of 75 to 100 of the monomer represented by the following formula 1: ##STR1## wherein: X is selected from the group consisting of --Cl, --F, or --CN, and Y is each independently selected from the group consisting of H, Cl, F, CN, CF.sub.3, CH.sub.3, C.sub.2 H.sub.5, n-C.sub.3 H.sub.7, iso-C.sub.3 H.sub.7, n-C.sub.4 H.sub.9, n-C.sub.5 H.sub.11, n-C.sub.6 H.sub.13, OCH.sub.3, OC.sub.2 H.sub.5, phenyl, C.sub.6 F.sub.5, C.sub.6 Cl.sub.5, CH.sub.2 Cl, CH.sub.2 F, Cl, F, CN, CF.sub.3, C.sub.2 F.sub.5, n-C.sub.3 F.sub.7, iso-C.sub.3 F.sub.7, OCF.sub.3, OC.sub.2 F.sub.5, OC.sub.3 F.sub.7, C(CF.sub.3).sub.3, CH.sub.2 (CF.sub.3), CH(CF.sub.3).sub.2, COCF.sub.3, COC.sub.2 F.sub.5, COCH.sub.3, COC.sub.2 H.sub.5 ; and the second polymer is a microgel particle.
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