Curable composition, color filter and process for production thereof, and solid-state imaging device
    1.
    发明授权
    Curable composition, color filter and process for production thereof, and solid-state imaging device 有权
    可固化组合物,滤色器及其生产方法和固态成像装置

    公开(公告)号:US08492071B2

    公开(公告)日:2013-07-23

    申请号:US12935535

    申请日:2009-03-27

    Inventor: Hiroshi Taguchi

    Abstract: A curable composition containing (A) a polymerizable compound having an alkyleneoxy group having two or more carbon atoms, (B) a polymerizable compound lacking an alkyleneoxy group having two or more carbon atoms, (C) an i-line absorber, (D) a photopolymerization initiator, (E) an alkali-soluble resin, and (F) a pigment, wherein a mass ratio [(A)/((A)+(B))] is from 0.5 to 0.9, and an i-line transmittance obtainable when the curable composition is formed into a coating film having a thickness of 0.7 μm, is 10% or less. The curable composition of the invention has enhanced adhesiveness upon forming a micro pattern, and can reduce development residues in unexposed non-cured areas. The curable composition of the invention is suitable for the use in color filters.

    Abstract translation: 一种包含(A)具有碳原子数2以上的亚烷基氧基的聚合性化合物的固化性组合物,(B)不具有碳原子数2以上的亚烷基氧基的聚合性化合物,(C)i线吸收剂,(D) 光聚合引发剂,(E)碱溶性树脂和(F)颜料,其中质量比[(A)/((A)+(B))]为0.5〜0.9,i- 当固化性组合物形成厚度为0.7μm的涂膜时的透光率为10%以下。 本发明的固化性组合物在形成微图案时具有增强的粘附性,并且可以减少未曝光的未固化区域中的显影残留。 本发明的可固化组合物适用于滤色器。

    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    3.
    发明申请
    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    正电阻组合物和形成电阻图案的方法

    公开(公告)号:US20100047724A1

    公开(公告)日:2010-02-25

    申请号:US12534735

    申请日:2009-08-03

    CPC classification number: G03F7/0048 G03F7/0046 G03F7/0397 G03F7/2041

    Abstract: A positive resist composition including: a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid; and an acid-generator component (B) which generates acid upon exposure; dissolved in an organic solvent (S), the organic solvent (S) including an alcohol-based organic solvent having a boiling point of at least 150° C.; and a method of forming a resist pattern including: applying the positive resist composition on a substrate on which a first resist pattern is formed to form a second resist film; and subjecting the second resist film to selective exposure and alkali developing to form a resist pattern.

    Abstract translation: 一种正型抗蚀剂组合物,其包含:在酸的作用下在碱性显影液中显示增加的溶解度的碱成分(A) 和在暴露时产生酸的酸发生剂组分(B); 溶解在有机溶剂(S)中,有机溶剂(S)包括沸点为至少150℃的醇类有机溶剂; 以及形成抗蚀剂图案的方法,包括:将正性抗蚀剂组合物施加在其上形成有第一抗蚀剂图案的基板上以形成第二抗蚀剂膜; 并对第二抗蚀剂膜进行选择性曝光和碱显影以形成抗蚀剂图案。

    Industrial radiographic silver halide material suitable for rapid processing applications
    4.
    发明授权
    Industrial radiographic silver halide material suitable for rapid processing applications 失效
    适用于快速加工应用的工业射线卤化银材料

    公开(公告)号:US06936411B2

    公开(公告)日:2005-08-30

    申请号:US10758577

    申请日:2004-01-15

    Abstract: A silver halide industrial radiographic material comprising on at least one side of a support a hydrophilic gelatinous non-spectrally sensitized radiation-sensitive emulsion layer, having grains, coated in a total amount in the range from 6 to 20 g, expressed as an equivalent amount of silver nitrate per square meter, and at least one non-radiation sensitive protective gelatinous antistress overcoat layer thereupon, wherein a ratio of gelatin to silver, expressed as silver nitrate in the said layer arrangement is at least 0.70, wherein said gelatinous layers are hardened by a gelatin cross-linking agent in an amount in order to have a dissolving time of at least 40 minutes, said time being defined as the period of time from the moment when the silver halide photographic material, dipped into 50 ml of an aqueous solution of 1.5% by weight of sodium hydroxide at 50° C., until the moment that the base becomes visible due to dissolving of the layers coated thereupon, is characterized by a hydrophilic gelatinous layer arrangement wherein a hydrophilic polymer is present in an amount of at least 1 g per m2.

    Abstract translation: 一种卤化银工业射线照相材料,其在载体的至少一侧上包含亲水性凝胶状非光谱敏化型辐射敏感乳剂层,其具有以6至20g的总量涂覆的颗粒,其表示为当量 每平方米的硝酸银和至少一种非辐射敏感性的防静电胶质抗静电外涂层,其中所述层布置中以硝酸银表示的明胶与银的比例至少为0.70,其中所述凝胶状层被硬化 通过明胶交联剂以使溶解时间至少为40分钟,所述时间定义为从卤化银照相材料浸入50ml水溶液中的时间 在50℃下为1.5重量%的氢氧化钠,直到由于其上涂覆的层的溶解使基体变得可见的时刻,其特征在于 亲水凝胶层布置,其中亲水性聚合物以每平方米至少1克的量存在。

    Method of preparing (100) tabular grains rich in silver bromide
    6.
    发明授权
    Method of preparing (100) tabular grains rich in silver bromide 失效
    制备(100)富含溴化银的片状晶粒的方法

    公开(公告)号:US6080536A

    公开(公告)日:2000-06-27

    申请号:US267635

    申请日:1999-03-15

    CPC classification number: G03C1/07 G03C1/0051 G03C1/053 G03C1/047 Y10S430/167

    Abstract: A method has been described of preparing a photosensitive emulsion comprising tabular silver halide grains rich in silver bromide, having {100} major faces and an aspect ratio more than 1.5, wherein at least 50% of the projected area of all grains is provided by said {100} tabular grains, said method comprising the step of running in a reaction vessel an aqueous silver salt solution and an aqueous alkali halide solution rich in alkali bromide, characterized in that before starting running said reaction vessel comprises in an aqueous solution of gelatin an amount of amino-modified polyvinyl alcohol as an aqueous soluble polymer.

    Abstract translation: 已经描述了一种制备感光乳剂的方法,其包含富含溴化银的片状卤化银颗粒,其具有{100}主面和大于1.5的纵横比,其中所有颗粒的投影面积的至少50%由所述 所述方法包括在反应容器中运行富含碱金属溴化物的银盐溶液和碱金属卤化物水溶液的步骤,其特征在于在开始运行之前,所述反应容器包含在明胶水溶液中 氨基改性的聚乙烯醇作为水溶性聚合物的量。

    Method for preparing tabular grains rich in silver chloride with reduced
thickness growth and improved homogeneity

    公开(公告)号:US6010840A

    公开(公告)日:2000-01-04

    申请号:US232733

    申请日:1999-01-19

    CPC classification number: G03C1/0053 G03C1/07 G03C5/16

    Abstract: A method has been described for preparing a gelatinous emulsion having grains rich in silver choride, wherein at least 70%, and more preferred 90%, of the total projected area of all grains is provided by {111} tabular grains having an average aspect ratio of more than 2:1, an average equivalent circular diameter of at least 0.3 .mu.m and an average thickness of from 0.05 to 0.25 .mu.m , wherein a percent variation on average equivalent circular diameter of said tabular grains is 30% or less and wherein a percent variation on average thickness of said tabular grains is 20% or less and wherein said tabular grains are present in percent numerical amounts of at least 90%, said method comprising following steps:preparing in a reaction vessel a dispersion medium comprising an initial amount of a crystal habit modifying agent;precipitating therein silver halide crystal nuclei by double-jet precipitation of an aqueous silver nitrate and an aqueous solution comprising halide ions, wherein less than 10% by weight of a total amount of silver nitrate used is consumed;growing said silver halide crystal nuclei by further precipitation of silver halide by means of double-jet precipitation of an aqueous silver nitrate solution and an aqueous solution comprising halide ions, wherein more than 90% by weight of a total amount of silver nitrate is consumed, characterized in that during at least one of the said steps at least one compound is added to the said reaction vessel, said compound being a hydrophilic amphoteric block copolymer containing (i) a non-ionic acrylic block comprising a sequence of units having pendant nitrile groups according to formula I given in the claims and (ii) a acrylamid(in)ic block comprising a sequence of units according to formula II given in the claims, said hydrophilic amphoteric block copolymer further comprising within said acrylamid(in)ic block(s) units having pendant acidic groups or salts thereof as well as units having pendant basic groups or salts thereof. Emulsions having tabular grains prepared according to the method of the present invention and light-sensitive silver halide photographic materials wherein said emulsions have been coated in light-sensitive layers have also been disclosed.

    Method for processing photographic silver halide photosensitive element
    8.
    发明授权
    Method for processing photographic silver halide photosensitive element 失效
    照相卤化银感光元件的处理方法

    公开(公告)号:US5948602A

    公开(公告)日:1999-09-07

    申请号:US063865

    申请日:1998-04-21

    CPC classification number: G03C1/053 G03C5/26 G03C1/0053

    Abstract: When a double-sided photographic silver halide photosensitive element having a crossover light quantity of up to 15% is processed through an automatic processor, it is developed with a developer containing an ascorbic acid type developing agent. By restricting the drag-out of the developer to 1.0 ml or less per 10.times.12-inch size sheet, the photosensitive element can be processed and effectively dried so as to produce high-quality images free of residual color.

    Abstract translation: 当通过自动处理器处理具有高达15%的交叉光量的双面照相卤化银感光元件时,用含有抗坏血酸型显影剂的显影剂显影。 通过将显影剂的拉伸限制为每10×12英寸尺寸的片材1.0ml或更少,可以处理和有效地干燥感光元件,以产生没有残留颜色的高质量图像。

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