发明授权
- 专利标题： Manufacturing method of samarium sulfide thin films
- 专利标题（中）： 硫化钐薄膜的制造方法
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申请号： US256222申请日： 1999-02-24
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公开(公告)号： US6132568A公开(公告)日： 2000-10-17
- 发明人: Ping Jin , Sakae Tanemura
- 申请人： Ping Jin , Sakae Tanemura
- 申请人地址： JPX Tokyo
- 专利权人： Japan as represented by Director General of Agency of Industrial Science and Technology
- 当前专利权人： Japan as represented by Director General of Agency of Industrial Science and Technology
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX10-062315 19980225
- 主分类号： C01F17/00
- IPC分类号： C01F17/00 ; C23C14/06 ; C23C14/34
摘要：
The present invention provides a method for producing a samarium monosulfide piezochromic thin film, and the present invention relates to a process for producing a thin film material at a high film formation rate by forming a samarium monosulfide thin film on a substrate by a reactive sputtering deposition process, which is a process for producing a samarium monosulfide (SmS) thin film, characterized by co-sputtering a disamarium trisulfide (Sm.sub.2 S.sub.3) compound target and a samarium (Sm) metal target simultaneously in an inert gas discharge.
公开/授权文献
- US5522542A Elastic fastening clamp in shape of a double C 公开/授权日：1996-06-04