发明授权
- 专利标题： Negative photoresist composition
- 专利标题（中）： 负光致抗蚀剂组合物
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申请号： US409693申请日： 1999-09-30
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公开(公告)号： US6132930A公开(公告)日： 2000-10-17
- 发明人: Shunichi Hayashi , Kazumi Higashi
- 申请人： Shunichi Hayashi , Kazumi Higashi
- 申请人地址： JPX Osaka
- 专利权人： Nitto Denko Corporation
- 当前专利权人： Nitto Denko Corporation
- 当前专利权人地址： JPX Osaka
- 优先权： JPX10-279513 19981001
- 主分类号： H05K3/18
- IPC分类号： H05K3/18 ; G03F7/004 ; G03F7/027 ; G03F7/038 ; G03F7/039
摘要：
A negative photoresist composition is disclosed which is excellent in sensitivity and resolution, tenaciously adheres to substrates, and can be advantageously used in practical production processes. Two 1,4-dihydropyridine derivatives each having a specific structure are incorporated as photosensitizers into a polyamic acid to obtain the negative photoresist composition.
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