发明授权
US6133614A Apparatus for detecting radiation and method for manufacturing such
apparatus
失效
用于检测辐射的装置和用于制造这种装置的方法
- 专利标题: Apparatus for detecting radiation and method for manufacturing such apparatus
- 专利标题(中): 用于检测辐射的装置和用于制造这种装置的方法
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申请号: US697281申请日: 1996-08-27
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公开(公告)号: US6133614A公开(公告)日: 2000-10-17
- 发明人: Tatsumi Shoji , Keiichi Kawasaki , Isao Tanikawa , Kazuaki Tashiro , Ichiro Tanaka , Tatsuya Yamazaki
- 申请人: Tatsumi Shoji , Keiichi Kawasaki , Isao Tanikawa , Kazuaki Tashiro , Ichiro Tanaka , Tatsuya Yamazaki
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX7-219308 19950828; JPX7-219309 19950828; JPX7-219310 19950828
- 主分类号: H01L27/146
- IPC分类号: H01L27/146 ; H01L31/00 ; H01L31/0232 ; H01L31/115
摘要:
A method for manufacturing a semiconductor apparatus for detecting radiation provided with phosphor comprises the steps of forming a phosphor layer integrally with a meshed partition plate having partitions per pixel of the semiconductor apparatus for detecting radiation, and of separating the phosphor per pixel by removing the phosphor on the partitioning portion of the partition plate by the irradiation of laser beam in the form of grooves together with the surface layer of the partitioning portions in order to make the phosphor thick to obtain a higher sensitivity, and also to make pixel pitches finer to enhance resolution, thus obtaining exact images without creating any cross talks between pixels.
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