发明授权
- 专利标题: Reactive sputtering of silicon and transition metal
- 专利标题(中): 硅和过渡金属的反应溅射
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申请号: US981706申请日: 1992-11-25
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公开(公告)号: US6139969A公开(公告)日: 2000-10-31
- 发明人: James J. Finley
- 申请人: James J. Finley
- 申请人地址: OH Cleveland
- 专利权人: PPG Industries Ohio, Inc.
- 当前专利权人: PPG Industries Ohio, Inc.
- 当前专利权人地址: OH Cleveland
- 主分类号: C03C17/09
- IPC分类号: C03C17/09 ; C03C17/22 ; C03C17/245 ; C03C17/34 ; C03C17/36 ; C03C17/40 ; C23C14/06 ; C23C14/08 ; C23C14/18
摘要:
Low absorbance coatings of silicon-nickel alloy in the form of oxides, nitrides and oxynitrides are disclosed along with a method for producing them by sputtering silicon-nickel targets comprising 3 to 18 weight percent nickel in atmospheres comprising reactive gases such as nitrogen, oxygen and mixtures thereof which may further comprise inert gas such as argon. The presence of nickel in the range of 3 to 18 weight percent provides target stability and enhanced sputtering rates over target of silicon alone or alloyed with aluminum, while maintaining a low refractive index and low absorbance, not only when sputtering in oxygen to produce an oxide coating, but also when sputtering in nitrogen or a mixture of nitrogen and oxygen to produce coatings of silicon-nickel nitride or oxynitride respectively.
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