发明授权
US6141038A Alignment correction prior to image sampling in inspection systems 失效
在检查系统中进行图像采样之前的对准校正

Alignment correction prior to image sampling in inspection systems
摘要:
A method and apparatus, and variations of each, for inspecting a wafer defining at least one die thereon is disclosed. The present invention first obtains the electronic image equivalent of two die, and then determines the x and y offset between those electronic images. Prior to inspection for defects, those two electronic images are aligned by adjusting the x and y positions of one electronic image of one die with respect to the electronic image of the other die. Once that is accomplished, those electronic images are compared to detect any defects that may exist on one of the die.
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