- 专利标题： Polycyclic resist compositions with increased etch resistance
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申请号： US253497申请日： 1999-02-19
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公开(公告)号： US6147177A公开(公告)日： 2000-11-14
- 发明人: Saikumar Jayaraman , Brian Leslie Goodall , Larry Funderburk Rhodes , Robert Adam Shick , Richard Vicari , Robert David Allen , Juliann Opitz , Ratnam Sooriyakumaran , Thomas Wallow
- 申请人： Saikumar Jayaraman , Brian Leslie Goodall , Larry Funderburk Rhodes , Robert Adam Shick , Richard Vicari , Robert David Allen , Juliann Opitz , Ratnam Sooriyakumaran , Thomas Wallow
- 申请人地址： NY New York NY Armonk
- 专利权人： The B. F. Goodrich Company,International Business Machines Corporation
- 当前专利权人： The B. F. Goodrich Company,International Business Machines Corporation
- 当前专利权人地址： NY New York NY Armonk
- 主分类号： C08F4/80
- IPC分类号： C08F4/80 ; C08F32/08 ; C08F232/08 ; C08G61/06 ; C08G61/08 ; G03F7/004 ; G03F7/038 ; G03F7/039 ; C08F132/08
摘要：
Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.
公开/授权文献
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