Invention Grant
- Patent Title: Method for DRAM cell arrangement and method for its production
- Patent Title (中): DRAM单元布置方法及其制作方法
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Application No.: US09541952Application Date: 2000-04-03
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Publication No.: US06184045B2Publication Date: 2001-02-06
- Inventor: Franz Hofman , Lothar Risch , Wolfgang Roesner , Wolfgang Krautschneider
- Applicant: Franz Hofman , Lothar Risch , Wolfgang Roesner , Wolfgang Krautschneider
- Priority: DE19800752 19980112
- Main IPC: H01L218242
- IPC: H01L218242

Abstract:
A memory cell contains at least one transistor and one capacitor connected to an upper bit line. The capacitor contains a first capacitor electrode arranged above the transistor, and is connected to the transistor. The upper bit line can be created in self-adjusted fashion on the basis of trenches which are of different widths, which extend transversely to one another, and which are arranged between the first capacitor electrodes. At least a part of each first capacitor electrode can be created from a layer which is structured by the trenches. Trenches can be narrowed by spacers.
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