Invention Grant
US06184045B2 Method for DRAM cell arrangement and method for its production 有权
DRAM单元布置方法及其制作方法

Method for DRAM cell arrangement and method for its production
Abstract:
A memory cell contains at least one transistor and one capacitor connected to an upper bit line. The capacitor contains a first capacitor electrode arranged above the transistor, and is connected to the transistor. The upper bit line can be created in self-adjusted fashion on the basis of trenches which are of different widths, which extend transversely to one another, and which are arranged between the first capacitor electrodes. At least a part of each first capacitor electrode can be created from a layer which is structured by the trenches. Trenches can be narrowed by spacers.
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