发明授权
US06193911B1 Precursor solution compositions for electronic devices using CCVD
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使用CCVD的电子设备的前体溶液组合物
- 专利标题： Precursor solution compositions for electronic devices using CCVD
- 专利标题（中）： 使用CCVD的电子设备的前体溶液组合物
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申请号： US09069640申请日： 1998-04-29
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公开(公告)号： US06193911B1公开(公告)日： 2001-02-27
- 发明人: Andrew T. Hunt , Tzyy Jiuan Hwang , Helmut G. Hornis , Hong Shao , Joe Thomas , Wen-Yi Lin , Shara S. Shoup , Henry A. Luten , John Eric McEntyre
- 申请人： Andrew T. Hunt , Tzyy Jiuan Hwang , Helmut G. Hornis , Hong Shao , Joe Thomas , Wen-Yi Lin , Shara S. Shoup , Henry A. Luten , John Eric McEntyre
- 主分类号： H01B106
- IPC分类号： H01B106
摘要：
Precursor solutions are provided to produce thin film resistive materials by combustion chemical vapor deposition (CCVD) or controlled atmosphere combustion chemical vapor deposition (CACCVD). The resistive material may be a mixture of a zero valence metal and a dielectric material, or the resistive materials may be a conductive oxide.
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