发明授权
- 专利标题: Liquid feed vaporization system and gas injection device
- 专利标题(中): 液体进料蒸发系统和气体注入装置
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申请号: US08974512申请日: 1997-11-19
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公开(公告)号: US06195504B1公开(公告)日: 2001-02-27
- 发明人: Kuniaki Horie , Hidenao Suzuki , Tsutomu Nakada , Fumio Kuriyama , Takeshi Murakami , Masahito Abe , Yuji Araki , Hiroyuki Ueyama
- 申请人: Kuniaki Horie , Hidenao Suzuki , Tsutomu Nakada , Fumio Kuriyama , Takeshi Murakami , Masahito Abe , Yuji Araki , Hiroyuki Ueyama
- 优先权: JP8-324637 19961120; JP9-102810 19970404; JP9-184485 19970625; JP9-289133 19971006
- 主分类号: A61H3306
- IPC分类号: A61H3306
摘要:
A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO3, SrTiO3 and others such materials. The vaporization apparatus comprises a feed tank for storing the liquid feed; feed delivery means for transporting the liquid feed by way of a feed delivery path; a vaporizer section disposed in the delivery path comprising a high temperature heat exchanger having a capillary tube for transporting the liquid feed and a heat source for externally heating the capillary tube; and a vaporization prevention section disposed upstream of the vaporizer section for preventing heating effects of the vaporizer section to the liquid feed within the vaporization prevention section.
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