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    Liquid feed vaporization system and gas injection device
    2.
    发明授权
    Liquid feed vaporization system and gas injection device 失效
    液体进料蒸发系统和气体注入装置

    公开(公告)号：US06195504B1

    公开(公告)日：2001-02-27

    申请号：US08974512

    申请日：1997-11-19

    申请人： Kuniaki Horie ,  Hidenao Suzuki ,  Tsutomu Nakada ,  Fumio Kuriyama ,  Takeshi Murakami ,  Masahito Abe ,  Yuji Araki ,  Hiroyuki Ueyama

    发明人： Kuniaki Horie ,  Hidenao Suzuki ,  Tsutomu Nakada ,  Fumio Kuriyama ,  Takeshi Murakami ,  Masahito Abe ,  Yuji Araki ,  Hiroyuki Ueyama

    IPC分类号： A61H3306

    CPC分类号： C23C16/45565 ,  C23C16/448 ,  C23C16/45561 ,  C23C16/4557

    摘要： A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO3, SrTiO3 and others such materials. The vaporization apparatus comprises a feed tank for storing the liquid feed; feed delivery means for transporting the liquid feed by way of a feed delivery path; a vaporizer section disposed in the delivery path comprising a high temperature heat exchanger having a capillary tube for transporting the liquid feed and a heat source for externally heating the capillary tube; and a vaporization prevention section disposed upstream of the vaporizer section for preventing heating effects of the vaporizer section to the liquid feed within the vaporization prevention section.

    摘要翻译： 提供了一种紧凑的蒸发器系统，用于从液体进料产生高质量的蒸汽进料，以将其输送到化学气相沉积处理室，以产生基于高电介质或铁电材料如BaTiO 3，SrTiO 3等材料的薄膜器件。 蒸发装置包括用于储存液体进料的进料罐; 用于通过进料输送路径输送液体进料的进料输送装置; 设置在输送路径中的蒸发器部分包括具有用于输送液体进料的毛细管和用于外部加热毛细管的热源的高温热交换器; 以及蒸发防止部，其设置在所述蒸发部的上游侧，用于防止所述蒸发部对所述蒸发防止部内的所述液体进料的加热效果。

    Liquid feed vaporization system and gas injection device
    4.
    发明授权
    Liquid feed vaporization system and gas injection device 失效
    液体进料蒸发系统和气体注入装置

    公开(公告)号：US06282368B1

    公开(公告)日：2001-08-28

    申请号：US09663358

    申请日：2000-09-15

    申请人： Kuniaki Horie ,  Hidenao Suzuki ,  Tsutomu Nakada ,  Takeshi Murakami ,  Masahito Abe ,  Yuji Araki ,  Hiroyuki Ueyama

    发明人： Kuniaki Horie ,  Hidenao Suzuki ,  Tsutomu Nakada ,  Takeshi Murakami ,  Masahito Abe ,  Yuji Araki ,  Hiroyuki Ueyama

    IPC分类号： A61H3306

    CPC分类号： C23C16/45565 ,  C23C16/448 ,  C23C16/45561 ,  C23C16/4557

    摘要： A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO3, SrTiO3 and other such materials. The vaporization apparatus comprises a feed tank for storing the liquid feed; feed delivery means for transporting the liquid feed by way of a feed delivery path; a vaporizer section disposed in the delivery path comprising a high temperature heat exchanger having a capillary tube for transporting the liquid feed and a heat source for externally heating the capillary tube; and a vaporization prevention section disposed upstream of the vaporizer section for preventing effects of the vaporizer section to the liquid feed within the vaporization prevention section.

    摘要翻译： 提供了一种紧凑的蒸发器系统，以从液体进料产生高品质的蒸气进料，以将其输送到化学气相沉积处理室，以产生基于高电介质或铁电材料如BaTiO 3，SrTiO 3等材料的薄膜器件。 蒸发装置包括用于储存液体进料的进料罐; 用于通过进料输送路径输送液体进料的进料输送装置; 设置在输送路径中的蒸发器部分包括具有用于输送液体进料的毛细管和用于外部加热毛细管的热源的高温热交换器; 以及设置在蒸发部的上游的防蒸发部，用于防止蒸发部对蒸发防止部内的液体进料的影响。

    Thin-film deposition apparatus
    5.
    发明授权
    Thin-film deposition apparatus 失效
    薄膜沉积装置

    公开(公告)号：US06176929B1

    公开(公告)日：2001-01-23

    申请号：US09118177

    申请日：1998-07-17

    申请人： Yukio Fukunaga ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Kuniaki Horie ,  Hiroyuki Ueyama ,  Takeshi Murakami

    发明人： Yukio Fukunaga ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Kuniaki Horie ,  Hiroyuki Ueyama ,  Takeshi Murakami

    IPC分类号： C23C1600

    CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/4557 ,  C23C16/45591 ,  C23C16/46

    摘要： A compact thin-film deposition apparatus can promote a stable growth of a high quality thin-film product of uniform quality. The apparatus comprises a vacuum-tight deposition chamber enclosing a substrate holding device for holding a substrate. An elevator device for moving the substrate holding device and a gas showering head for flowing a film forming gas towards the substrate are provided. A transport opening and an exhaust opening are provided on a wall section of the deposition chamber at a height corresponding to the transport position and the deposition position, respectively. The deposition chamber is provided with a flow guiding member, and the flow guiding member comprises a cylindrical member to surround an elevating path of the substrate holding device and a first ring member to vertically divide a chamber space at a height between the exhaust opening and the transport opening.

    摘要翻译： 紧凑的薄膜沉积装置可以促进质量均匀的高质量薄膜产品的稳定生长。 该装置包括一个真空密封的沉积室，其包围用于保持基板的基板保持装置。 提供了一种用于移动基板保持装置的电梯装置和用于使成膜气体朝向基板流动的气体淋浴头。 输送开口和排气口分别设置在沉积室的壁部分上，其高度分别对应于输送位置和沉积位置。 沉积室设置有导流构件，并且流动引导构件包括圆筒构件以包围基板保持装置的升降路径和第一环构件，以在排气口和排气口之间的高度垂直分隔腔室空间 运输开放。

    Plating apparatus
    6.
    发明授权
    Plating apparatus 有权
    电镀装置

    公开(公告)号：US06379520B1

    公开(公告)日：2002-04-30

    申请号：US09601084

    申请日：2000-07-27

    申请人： Fumio Kuriyama ,  Hiroyuki Ueyama ,  Junitsu Yamakawa ,  Kenichi Suzuki ,  Atsushi Chono

    发明人： Fumio Kuriyama ,  Hiroyuki Ueyama ,  Junitsu Yamakawa ,  Kenichi Suzuki ,  Atsushi Chono

    IPC分类号： C25D2112

    CPC分类号： C25D21/14 ,  C25D17/001 ,  C25D21/16 ,  C25D21/18

    摘要： The plating apparatus has a plating section in which a plating process is performed and a control section for regulating the plating solution. The plating section includes a plating bath containing plating solution, an anode provided in the plating solution, and a plating object serving as a cathode placed in the plating solution opposite the anode. The control section includes a regulating tank for regulating the composition and/or concentration of the plating solution, and a replenishing tank for injecting solution into the plating solution in the regulating tank. The plating apparatus also includes a mechanism for circulating plating solution between the regulating tank in the control section and the plating bath in the plating section. The plating section is installed in a first room, while the control section is installed in a second room, which is separate from the first room Accordingly, contamination in the plating section is prevented.

    摘要翻译： 电镀装置具有执行电镀处理的电镀部分和用于调节电镀液的控制部分。 电镀部分包括含有电镀液的镀浴，设置在电镀液中的阳极，以及放置在与阳极相对的电镀溶液中的用作阴极的电镀对象。 控制部分包括用于调节电镀溶液的组成和/或浓度的调节罐，以及用于将溶液注入调节罐中的电镀溶液的补充槽。 电镀装置还包括用于在控制部分中的调节罐和电镀部分中的镀浴之间循环电镀液的机构。 电镀部分安装在第一房间中，而控制部分安装在与第一房间分开的第二房间中。因此，防止了电镀部分中的污染。

    Plating apparatus
    7.
    再颁专利
    Plating apparatus 有权

    公开(公告)号：USRE39123E1

    公开(公告)日：2006-06-13

    申请号：US10187801

    申请日：1999-11-26

    申请人： Fumio Kuriyama ,  Hiroyuki Ueyama ,  Junitsu Yamakawa ,  Kenichi Suzuki ,  Atsushi Chono

    发明人： Fumio Kuriyama ,  Hiroyuki Ueyama ,  Junitsu Yamakawa ,  Kenichi Suzuki ,  Atsushi Chono

    IPC分类号： C25D21/12 ,  C25B15/00 ,  C25B7/00

    CPC分类号： C25D21/14 ,  C25D17/001 ,  C25D21/16 ,  C25D21/18

    摘要： The plating apparatus has a plating section in which a plating process is performed and a control section for regulating the plating solution. The plating section includes a plating bath containing plating solution, an anode provided in the plating solution, and a plating object serving as a cathode placed in the plating solution opposite the anode. The control section includes a regulating tank for regulating the composition and/or concentration of the plating solution, and a replenishing tank for injecting solution into the plating solution in the regulating tank. The plating apparatus also includes a mechanism for circulating plating solution between the regulating tank in the control section and the plating bath in the plating section. The plating section is installed in a first room, while the control section is installed in a second room, which is separate from the first room Accordingly, contamination in the plating section is prevented.

    Hydrophilic polysiloxane macromonomer, and production and use of the same
    8.
    发明授权
    Hydrophilic polysiloxane macromonomer, and production and use of the same 有权
    亲水性聚硅氧烷大分子单体，并且生产和使用相同

    公开(公告)号：US08524850B2

    公开(公告)日：2013-09-03

    申请号：US13411709

    申请日：2012-03-05

    申请人： Hiroyuki Ueyama ,  Seiichiro Ikawa ,  Junichi Iwata

    发明人： Hiroyuki Ueyama ,  Seiichiro Ikawa ,  Junichi Iwata

    IPC分类号： C08G77/46 ,  C08G77/20

    CPC分类号： C08F283/12 ,  C08F8/42 ,  C08F290/06 ,  C08F290/061 ,  C08F290/068 ,  C08G77/38 ,  C08G77/46 ,  G02B1/043 ,  C08L83/12 ,  C08L51/085

    摘要： PROBLEM TO BE SOLVEDTo provide an ophthalmic lens, which can be more safely worn, that is, to provide a material, which is transparent and has high oxygen permeability and a high hydrophilic property, and to provide a novel monomer to be a raw material thereof.SOLUTIONA hydrophilic polysiloxane macromonomer contains polyoxyethylene as a hydrophilic side chains in a polysiloxane main chain, wherein transparency, oxygen permeability, and hydrophilic properties of the material are controlled by regulating the length of the polysiloxane main chain, the length of the hydrophilic polyoxyethylene side chains, and the number of the side chains.

    摘要翻译： 要解决的问题为了提供可以更安全地佩戴的眼用镜片，即提供透明且具有高透氧性和高亲水性的材料，并提供作为原料的新型单体 其中。 解决方案亲水性聚硅氧烷大分子单体在聚硅氧烷主链中含有聚氧乙烯作为亲水侧链，其中通过调节聚硅氧烷主链的长度，亲水性聚氧乙烯侧链的长度来控制材料的透明度，透氧性和亲水性 ，和侧链的数量。

    Hydrophilic Polysiloxane Macromonomer, And Production And Use Of The Same
    9.
    发明申请
    Hydrophilic Polysiloxane Macromonomer, And Production And Use Of The Same 有权
    亲水性聚硅氧烷大分子单体，以及其生产和使用

    公开(公告)号：US20120184698A1

    公开(公告)日：2012-07-19

    申请号：US13411709

    申请日：2012-03-05

    申请人： Hiroyuki Ueyama ,  Seiichiro Ikawa ,  Junichi Iwata

    发明人： Hiroyuki Ueyama ,  Seiichiro Ikawa ,  Junichi Iwata

    IPC分类号： C08G77/04 ,  C08G77/06

    CPC分类号： C08F283/12 ,  C08F8/42 ,  C08F290/06 ,  C08F290/061 ,  C08F290/068 ,  C08G77/38 ,  C08G77/46 ,  G02B1/043 ,  C08L83/12 ,  C08L51/085

    摘要： PROBLEM TO BE SOLVEDTo provide an ophthalmic lens, which can be more safely worn, that is, to provide a material, which is transparent and has high oxygen permeability and a high hydrophilic property, and to provide a novel monomer to be a raw material thereof.SOLUTIONA hydrophilic polysiloxane macromonomer contains polyoxyethylene as a hydrophilic side chains in a polysiloxane main chain, wherein transparency, oxygen permeability, and hydrophilic properties of the material are controlled by regulating the length of the polysiloxane main chain, the length of the hydrophilic polyoxyethylene side chains, and the number of the side chains.

    摘要翻译： 要解决的问题为了提供可以更安全地佩戴的眼用镜片，即提供透明且具有高透氧性和高亲水性的材料，并提供作为原料的新型单体 其中。 解决方案亲水性聚硅氧烷大分子单体在聚硅氧烷主链中含有聚氧乙烯作为亲水侧链，其中通过调节聚硅氧烷主链的长度，亲水性聚氧乙烯侧链的长度来控制材料的透明度，透氧性和亲水性 ，和侧链的数量。