发明授权
- 专利标题： Photoresist comprising blends of photoacid generators
- 专利标题（中）： 光致抗蚀剂包含光致酸发生剂的混合物
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申请号： US09552211申请日： 2000-04-19
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公开(公告)号： US06203965B1公开(公告)日： 2001-03-20
- 发明人: James F. Cameron , James Michael Mori , George W. Orsula , James W. Thackeray , Wu-Song Huang , Ronald A. DellaGuardia , Kuang-Jung Chen , Hiroshi Ito , Wayne M. Moreau
- 申请人： James F. Cameron , James Michael Mori , George W. Orsula , James W. Thackeray , Wu-Song Huang , Ronald A. DellaGuardia , Kuang-Jung Chen , Hiroshi Ito , Wayne M. Moreau
- 主分类号： G03F7004
- IPC分类号： G03F7004
摘要：
The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size. A specific composition comprises a terpolymer having units of hydroxystyrene, styrene and t-butyl acrylate with the photoacid generators di-(4-tbutylphenyl)iodonium camphorsulfonate and di-(4-t-butylphenyl)iodonium o-trifluoromethylbenzene sulfonate.
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