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1.发明授权Photoresist compositions and methods and articles of manufacture comprising same 有权光致抗蚀剂组合物及其制造方法及其制造方法公开(公告)号：US07704668B1
公开(公告)日：2010-04-27
申请号：US09129113
申请日：1998-08-04
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0048 , Y10S430/114 , Y10S430/115
摘要： The invention provides positive-acting chemically-amplified photoresist compositions that can provide excellent lithographic performance as well as significantly enhanced storage stability. In one aspect, photoresist compositions are provided that comprise a solvent that is free of hydroxy groups (i.e. non-hydroxylic solvent), a resin binder and a photoactive compound that exhibits enhanced and long-term solubility in the solvent. In a further aspect, resists are provided that are formulated in a hydroxyl-containing solvent such as ethyl lactate and that contains a sulfonium salt photoactive compound that includes a sulfonate counter anion that can provide enhanced storage stability for the resist.
摘要翻译： 本发明提供了可以提供优异的平版印刷性能以及显着增强的储存稳定性的正性化学扩增的光致抗蚀剂组合物。 在一个方面，提供了包含不含羟基的溶剂（即非羟基溶剂）的光致抗蚀剂组合物，在溶剂中表现出增强的和长期溶解度的树脂粘合剂和光活性化合物。 在另一方面，提供抗蚀剂，其配制在含羟基的溶剂如乳酸乙酯中，并且含有锍盐光活性化合物，其包含可提供抗蚀剂的增强的储存稳定性的磺酸盐抗衡阴离子。
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公开(公告)号：US20080248426A1
公开(公告)日：2008-10-09
申请号：US11981621
申请日：2007-10-31
摘要： Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
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公开(公告)号：US06200728B1
公开(公告)日：2001-03-13
申请号：US09253171
申请日：1999-02-20
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , Y10S430/114 , Y10S430/115 , Y10S430/122
摘要： The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size.
摘要翻译： 本发明提供了含有树脂粘合剂和光致酸发生剂的混合物的新的光致抗蚀剂组合物。 本发明的光酸发生剂共混物产生酸强度和/或尺寸不同的光酸。
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公开(公告)号：US06773864B1
公开(公告)日：2004-08-10
申请号：US10335476
申请日：2002-12-31
IPC分类号： G03G500
摘要： Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
摘要翻译： 用于减少光致抗蚀剂外涂层的曝光辐射的反射的抗晕化组合物和方法。 本发明的防光组合物包括树脂粘合剂和能够引起树脂粘合剂的热诱导交联反应的材料。
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公开(公告)号：US06528235B2
公开(公告)日：2003-03-04
申请号：US10163920
申请日：2002-06-06
IPC分类号： G03C500
摘要： Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
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公开(公告)号：US5919597A
公开(公告)日：1999-07-06
申请号：US961112
申请日：1997-10-30
申请人： Roger F. Sinta , Uday Kumar , George W. Orsula , James I. T. Fahey , William R. Brunsvold , Wu-Song Huang , Ahmad D. Katnani , Ronald W. Nunes , Mahmoud M. Khojasteh
发明人： Roger F. Sinta , Uday Kumar , George W. Orsula , James I. T. Fahey , William R. Brunsvold , Wu-Song Huang , Ahmad D. Katnani , Ronald W. Nunes , Mahmoud M. Khojasteh
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： Methods are provided to prepare photoresists without isolation of various components, i.e. in a "one-pot" procedure. Preferred one-pot preparation methods of the invention include preparing a photoresist resin binder in a selected photoresist solvent and, without isolation of the resin binder from the solvent, adding a photoactive component and any other desired photoresist materials to the resin binder in solution to thereby provide a liquid photoresist composition in the solvent in which the resin binder was prepared. The invention also provides novel methods for synthesizing resist resin binders, particularly phenolic polymers that contain phenolic OH groups covalently bonded to another moiety such as acid labile groups or inert blocking groups.
摘要翻译： 提供了方法来制备光刻胶，而不分离各种组分，即在“一锅”方法中。 本发明优选的一锅制备方法包括在所选择的光致抗蚀剂溶剂中制备光致抗蚀剂树脂粘合剂，并且不从树脂粘合剂与溶剂分离，将光敏组分和任何其它所需的光致抗蚀剂材料加入到溶液中的树脂粘合剂中 在其中制备树脂粘合剂的溶剂中提供液体光致抗蚀剂组合物。 本发明还提供用于合成抗蚀剂树脂粘合剂，特别是含有共价键合到另一部分如酚不稳定基团或惰性封闭基团的酚OH基团的酚类聚合物的新方法。
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公开(公告)号：US07378222B2
公开(公告)日：2008-05-27
申请号：US11328928
申请日：2006-01-09
IPC分类号： G03C1/492
摘要： Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
摘要翻译： 用于减少光致抗蚀剂外涂层的曝光辐射的反射的抗晕化组合物和方法。 本发明的防光组合物包括树脂粘合剂和能够引起树脂粘合剂的热诱导交联反应的材料。
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8.发明授权Substrates coated with an antihalation layer that contains a resin binder comprising anthracene units 失效涂覆有含有包含蒽单元的树脂粘合剂的防光晕层的基材
公开(公告)号：US5851730A
公开(公告)日：1998-12-22
申请号：US978827
申请日：1997-11-26
摘要： Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
摘要翻译： 用于减少光致抗蚀剂外涂层的曝光辐射的反射的抗晕化组合物和方法。 本发明的防光组合物包括树脂粘合剂和能够引起树脂粘合剂的热诱导交联反应的材料。
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公开(公告)号：US5541263A
公开(公告)日：1996-07-30
申请号：US404933
申请日：1995-03-16
CPC分类号： G03F7/0045 , G03F7/0236 , Y10S430/106
摘要： An alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The polymer is used for the formulation of acid hardening photoresists and the presence of the inert blocking group enables development of an exposed photoresist with a strong developer without formation of microbridges between fine line features.
摘要翻译： 具有一部分酚羟基的碱溶性树脂，优选酚醛树脂反应形成对酸或碱为惰性的封闭基团。 聚合物用于配制酸硬化光致抗蚀剂，并且惰性封闭基团的存在使得能够用强显影剂显影曝光的光致抗蚀剂，而不会在细线特征之间形成微桥。
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10.发明授权Photoresist compositions with copolymer binder having phenolic and nonaromatic cyclic alcohol units where the distribution of the cyclic alcohol concentration is less than 8 mole percent 失效具有酚醛和非芳香环醇单元的共聚物粘合剂的光致抗蚀剂组合物，其中环醇浓度的分布小于8摩尔％
公开(公告)号：US5340696A
公开(公告)日：1994-08-23
申请号：US10815
申请日：1993-01-29
CPC分类号： G03F7/0236 , G03F7/0233 , Y10S430/106 , Y10S430/11
摘要： The present invention relates to photoresists particularly suitable for deep U.V. exposure and having the capability of forming highly resolved features. The invention is characterized by use of a resist resin binder that comprises a nonaromatic cyclic alcohol-phenol copolymer that has a relatively low molecular weight and narrow distribution of molecular weight and cyclic alcohol concentration.
摘要翻译： 本发明涉及特别适用于深紫外线的光刻胶。 具有形成高度分辨特征的能力。 本发明的特征在于使用抗蚀剂树脂粘合剂，其包含分子量相对较低且分子量分布窄，环状醇浓度低的非芳香族环状醇 - 苯酚共聚物。
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