- 专利标题: Method of post CMP defect stability improvement
-
申请号: US09164860申请日: 1998-10-01
-
公开(公告)号: US06220941B1公开(公告)日: 2001-04-24
- 发明人: Boris Fishkin , Charles C. Garretson , Peter McKeever , Thomas H. Osterheld , Gopalakrishna B. Prabhu , Doyle E. Bennett , Benjamin A. Bonner , Sidney Huey
- 申请人: Boris Fishkin , Charles C. Garretson , Peter McKeever , Thomas H. Osterheld , Gopalakrishna B. Prabhu , Doyle E. Bennett , Benjamin A. Bonner , Sidney Huey
- 主分类号: B24B100
- IPC分类号: B24B100
摘要:
The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substrate surface, by delivering a spray of one or more rinse agents to the surface and, preferably, causing the rinse agent to flow across the surface from a central region to an outer region where unwanted debris and material is collected.
信息查询