发明授权
- 专利标题： Surface treatment method and system
- 专利标题（中）： 表面处理方法和系统
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申请号： US08548613申请日： 1995-10-26
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公开(公告)号： US06231777B1公开(公告)日： 2001-05-15
- 发明人: Naoyuki Kofuji , Shin Arai , Kazunori Tsujimoto , Tatsumi Mizutani , Keizo Suzuki , Kenichi Mizuishi
- 申请人： Naoyuki Kofuji , Shin Arai , Kazunori Tsujimoto , Tatsumi Mizutani , Keizo Suzuki , Kenichi Mizuishi
- 优先权： JP6-293688 19941101
- 主分类号： H01L21302
- IPC分类号： H01L21302
摘要：
A pulse voltage of duty ratio 5% or below and repetition frequency 400 KHz or above is supplied in order to suppress the notch, charge build-up damage, subtrench and bowing due to the electron shading phenomenon. Thus, a cycle for accelerating electrons occurs in the substrate bias, so that the electron shading phenomenon does not occur.
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