发明授权
- 专利标题: Method of forming sharp corners in a photoresist layer
- 专利标题(中): 在光致抗蚀剂层中形成锐角的方法
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申请号: US09379454申请日: 1999-08-23
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公开(公告)号: US06238850B1公开(公告)日: 2001-05-29
- 发明人: Orest Bula , Daniel Cole , Edward Winston Conrad , William Charles Leipold
- 申请人: Orest Bula , Daniel Cole , Edward Winston Conrad , William Charles Leipold
- 主分类号: G03C500
- IPC分类号: G03C500
摘要:
A method of forming an image having reduced comer rounding in a photoresist layer is provided which comprises exposing a photoresist layer to a first mask having a first image, said first image having at least two edges; exposing said photoresist layer to a second mask having a second image, said second image having at least two edges, the second image edges being substantially rotated relative to the first image edges to produce a latent image in said photoresist layer having edges substantially rotated relative to the first and second image edges; and developing the photoresist layer to produce said image.
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