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1.发明授权
公开(公告)号：US5740071A
公开(公告)日：1998-04-14
申请号：US487814
申请日：1995-06-07
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： A schematic modifier editor that works in concert with a shapes modifier editor so that changes to a design layout are reflected in the schematic. The shapes modifier editor tracks the changes made to the cell hierarchy and saves the changes to a list file. The schematic modifier editor processes the list file and edits the schematic file so that its cell hierarchy corresponds with that of the modified shapes file. The modified schematic file and modified shapes file can then be compared by a conventional verification program to ensure that the modified shapes file implements the desired circuit.
摘要翻译： 原理图修改器编辑器与形状修改器编辑器协同工作，以使设计布局的更改反映在原理图中。 形状修改器编辑器跟踪对单元格层次结构所做的更改，并将更改保存到列表文件中。 原理图修改器编辑器处理列表文件并编辑原理图文件，使其单元格层次结构与修改后的形状文件对应。 然后可以通过传统的验证程序来比较修改的原理图文件和修改的形状文件，以确保修改后的形状文件实现所需的电路。
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公开(公告)号：US06238850B1
公开(公告)日：2001-05-29
申请号：US09379454
申请日：1999-08-23
IPC分类号： G03C500
CPC分类号： G03F7/70433 , G03F7/203 , G03F7/70466
摘要： A method of forming an image having reduced comer rounding in a photoresist layer is provided which comprises exposing a photoresist layer to a first mask having a first image, said first image having at least two edges; exposing said photoresist layer to a second mask having a second image, said second image having at least two edges, the second image edges being substantially rotated relative to the first image edges to produce a latent image in said photoresist layer having edges substantially rotated relative to the first and second image edges; and developing the photoresist layer to produce said image.
摘要翻译： 提供了一种在光致抗蚀剂层中形成具有减角的图像的方法，其包括将光致抗蚀剂层暴露于具有第一图像的第一掩模，所述第一图像具有至少两个边缘; 将所述光致抗蚀剂层暴露于具有第二图像的第二掩模，所述第二图像具有至少两个边缘，所述第二图像边缘相对于所述第一图像边缘基本旋转，以在所述光致抗蚀剂层中产生潜像，所述潜像基本上相对于 第一和第二图像边缘; 并显影光致抗蚀剂层以产生所述图像。
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