Method of forming sharp corners in a photoresist layer
    1.
    发明授权
    Method of forming sharp corners in a photoresist layer 失效
    在光致抗蚀剂层中形成锐角的方法

    公开(公告)号:US06238850B1

    公开(公告)日:2001-05-29

    申请号:US09379454

    申请日:1999-08-23

    IPC分类号: G03C500

    摘要: A method of forming an image having reduced comer rounding in a photoresist layer is provided which comprises exposing a photoresist layer to a first mask having a first image, said first image having at least two edges; exposing said photoresist layer to a second mask having a second image, said second image having at least two edges, the second image edges being substantially rotated relative to the first image edges to produce a latent image in said photoresist layer having edges substantially rotated relative to the first and second image edges; and developing the photoresist layer to produce said image.

    摘要翻译: 提供了一种在光致抗蚀剂层中形成具有减角的图像的方法,其包括将光致抗蚀剂层暴露于具有第一图像的第一掩模,所述第一图像具有至少两个边缘; 将所述光致抗蚀剂层暴露于具有第二图像的第二掩模,所述第二图像具有至少两个边缘,所述第二图像边缘相对于所述第一图像边缘基本旋转,以在所述光致抗蚀剂层中产生潜像,所述潜像基本上相对于 第一和第二图像边缘; 并显影光致抗蚀剂层以产生所述图像。