发明授权
US06239031B1 Stepper alignment mark structure for maintaining alignment integrity
有权
用于保持对准完整性的步进对准标记结构
- 专利标题: Stepper alignment mark structure for maintaining alignment integrity
- 专利标题(中): 用于保持对准完整性的步进对准标记结构
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申请号: US09487493申请日: 2000-01-19
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公开(公告)号: US06239031B1公开(公告)日: 2001-05-29
- 发明人: Nick Kepler , Olov Karlsson , Larry Wang , Basab Bandyopadhyah , Effiong Ibok , Christopher F. Lyons
- 申请人: Nick Kepler , Olov Karlsson , Larry Wang , Basab Bandyopadhyah , Effiong Ibok , Christopher F. Lyons
- 主分类号: H01L21302
- IPC分类号: H01L21302
摘要:
Accurate photolighographic processing is achieved employing a stepper global alignment structure enabling formation thereon of a substantially transparent layer having a substantially planar upper surface. Embodiments include a set of global alignment marks comprising spaced apart trenches, each trench segmented into a plurality of narrow trenches spaced apart by uprights and forming a dummy topographical area of narrow trenches surrounding the set of alignment marks. The segmented trenches and the dummy topographical area effectively provide a substantially uniform topography enabling deposition of a transparent layer without steps and effective local planarization. Since the upper surface of the transparent layer is substantially planar, layers of material deposited on the transparent layer during subsequent processing also have a substantially planar upper surface, thereby enabling transmission of the signal produced by the alignment marks to the stepper with minimal distortion.
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