发明授权
- 专利标题： Selective etching of silicate
- 专利标题（中）： 选择性蚀刻硅酸盐
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申请号： US09221596申请日： 1998-12-29
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公开(公告)号： US06254796B1公开(公告)日： 2001-07-03
- 发明人: David L. Rath , Glenn W. Gale , Rangarajan Jagannathan , Kenneth J. McCullough , Karen P. Madden , Harald F. Okorn-Schmidt , Keith R. Pope
- 申请人： David L. Rath , Glenn W. Gale , Rangarajan Jagannathan , Kenneth J. McCullough , Karen P. Madden , Harald F. Okorn-Schmidt , Keith R. Pope
- 主分类号： H01L21302
- IPC分类号： H01L21302
摘要：
A silicate glass is selectively etched employing a composition containing a fluoride containing compound and certain organic solvents. Preferred compositions also include water.
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