发明授权
US06278163B1 HV transistor structure and corresponding manufacturing method 有权
HV晶体管结构及相应的制造方法

  • 专利标题: HV transistor structure and corresponding manufacturing method
  • 专利标题(中): HV晶体管结构及相应的制造方法
  • 申请号: US09224939
    申请日: 1998-12-31
  • 公开(公告)号: US06278163B1
    公开(公告)日: 2001-08-21
  • 发明人: Federico PioCarlo Riva
  • 申请人: Federico PioCarlo Riva
  • 优先权: EP97830744 19971231
  • 主分类号: H01L31062
  • IPC分类号: H01L31062
HV transistor structure and corresponding manufacturing method
摘要:
An HV transistor integrated in a semiconductor substrate with a first type of conductivity, comprising a gate region included between corresponding drain and source regions, and being of the type wherein at least said drain region is lightly doped with a second type of conductivity. The drain region comprises a contact region with the second type of conductivity but being more heavily doped, from which a contact pad extends.
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