发明授权
US06288412B1 Thin film transistors for display devices having two polysilicon active layers of different thicknesses
失效
用于具有不同厚度的两个多晶硅有源层的显示器件的薄膜晶体管
- 专利标题: Thin film transistors for display devices having two polysilicon active layers of different thicknesses
- 专利标题(中): 用于具有不同厚度的两个多晶硅有源层的显示器件的薄膜晶体管
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申请号: US08974746申请日: 1997-11-19
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公开(公告)号: US06288412B1公开(公告)日: 2001-09-11
- 发明人: Hiroki Hamada , Kiichi Hirano , Nobuhiro Gouda , Hisashi Abe , Eiji Taguchi , Nobuhiko Oda , Yoshihiro Morimoto
- 申请人: Hiroki Hamada , Kiichi Hirano , Nobuhiro Gouda , Hisashi Abe , Eiji Taguchi , Nobuhiko Oda , Yoshihiro Morimoto
- 优先权: JP6-6891 19940126; JP6-118850 19940531; JP6-285191 19941118; JP6-310825 19941214
- 主分类号: H01L2900
- IPC分类号: H01L2900
摘要:
A method of manufacturing a polycrystalline silicon film having a particular field effect mobility is disclosed. A first polycrystalline silicon film is formed on a transparent insulation substrate. The surface of the silicon film is oxidized, and an amorphous silicon film is formed on the first polycrystalline silicon film and oxide layer. The amorphous silicon film is subjected to a solid phase growth process to be converted to a second polycrystalline silicon film. The field effect mobility of the second polycrystalline silicon film can be adjusted to a desired value by controlling the relative thicknesses of the first and second polycrystalline silicon films.
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