发明授权
- 专利标题: Photoelectric conversion apparatus and method of manufacturing the same
- 专利标题(中): 光电转换装置及其制造方法
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申请号: US09176258申请日: 1998-10-21
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公开(公告)号: US06352875B1公开(公告)日: 2002-03-05
- 发明人: Shinichi Hayashi , Akira Funakoshi , Akira Tago , Satoshi Okada , Shinichi Takeda , Eiichi Takami , Masakazu Morishita , Chiori Mochizuki , Tadao Endo , Toshikazu Tamura
- 申请人: Shinichi Hayashi , Akira Funakoshi , Akira Tago , Satoshi Okada , Shinichi Takeda , Eiichi Takami , Masakazu Morishita , Chiori Mochizuki , Tadao Endo , Toshikazu Tamura
- 优先权: JP7-272997 19951020; JP8-007324 19960119; JP8-267138 19961008
- 主分类号: H01L310203
- IPC分类号: H01L310203
摘要:
In a photoelectric conversion apparatus obtained by arranging and fixing a plurality of semiconductor element substrates onto a base with an adhesive, the levels of the upper surfaces of the substrates are adjusted with a desired thickness of the adhesive so as to set the upper surfaces within the same plane while the distance from the upper surface of the base to the semiconductor element surface of each substrate is kept to a design value, thereby realizing a photoelectric conversion apparatus constituted by a plurality of substrates arranged two-dimensionally, which eliminates level gaps between the substrates, and hence is free from problems such as a decrease in resolution, a deterioration in sensitivity, and peeling of a phosphor and the like.
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