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US06362495B1 Dual-metal-trench silicon carbide Schottky pinch rectifier 失效
双金属沟槽碳化硅肖特基压紧整流器

Dual-metal-trench silicon carbide Schottky pinch rectifier
Abstract:
A dual-metal-trench silicon carbide Schottky pinch rectifier having a plurality of trenches formed in an n-type SiC substrate, with a Schottky contact having a relatively low barrier height on a mesa defined between adjacent ones of the trenches, and a Schottky contact having a relatively high barrier height at the bottom of each trench. The same metal used for the Schottky contact in each trench is deposited over the Schottky contact on the mesa. A simplified fabrication process is disclosed in which the high barrier height metal is deposited over the low barrier height metal and then used as an etch mask for reactive ion etching of the trenches to produce a self-aligned low barrier contact.
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