发明授权
US06368191B1 Carrier head with local pressure control for a chemical mechanical polishing apparatus 有权
用于化学机械抛光装置的具有局部压力控制的承载头

Carrier head with local pressure control for a chemical mechanical polishing apparatus
摘要:
A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane, the lower surface of which provides a substrate-receiving surface. The carrier head may include a projection which contacts an upper surface of the flexible membrane to apply an increased load to a potentially underpolished region of a substrate. Fluid jets may be used for the same purpose.
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