发明授权
US06368191B1 Carrier head with local pressure control for a chemical mechanical polishing apparatus
有权
用于化学机械抛光装置的具有局部压力控制的承载头
- 专利标题: Carrier head with local pressure control for a chemical mechanical polishing apparatus
- 专利标题(中): 用于化学机械抛光装置的具有局部压力控制的承载头
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申请号: US09665838申请日: 2000-09-20
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公开(公告)号: US06368191B1公开(公告)日: 2002-04-09
- 发明人: Steven M. Zuniga , Hung Chih Chen , Manoocher Birang , Kapila Wijekoon , Sen-Hou Ko
- 申请人: Steven M. Zuniga , Hung Chih Chen , Manoocher Birang , Kapila Wijekoon , Sen-Hou Ko
- 主分类号: B24B100
- IPC分类号: B24B100
摘要:
A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane, the lower surface of which provides a substrate-receiving surface. The carrier head may include a projection which contacts an upper surface of the flexible membrane to apply an increased load to a potentially underpolished region of a substrate. Fluid jets may be used for the same purpose.
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