发明授权
- 专利标题: Process for manufacture of microoptomechanical structures
- 专利标题(中): 微机电结构的制造工艺
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申请号: US09468141申请日: 1999-12-21
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公开(公告)号: US06379989B1公开(公告)日: 2002-04-30
- 发明人: Joel A. Kubby , Jingkuang Chen , Alex T. Tran
- 申请人: Joel A. Kubby , Jingkuang Chen , Alex T. Tran
- 主分类号: H01L2100
- IPC分类号: H01L2100
摘要:
A microoptomechanical structure produced by defining a microoptical structure in a single-crystal silicon layer separated by an insulator layer from a handle wafer, such as a SOI wafer, selectively etching the single crystal silicon layer, depositing a sacrificial oxide layer on the etched single crystal silicon layer, depositing and etching a polysilicon layer on the sacrificial oxide layer, with remaining polysilcon forming hinge elements, and releasing formed microoptical structures. Embodiments use an oxide as an insulator, and other embodiments provide for wafer bonding of the silicon layer to the insulator layer.
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