发明授权
- 专利标题： Semiconductor device having uniform spacers
- 专利标题（中）： 具有均匀间隔物的半导体器件
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申请号： US09567013申请日： 2000-05-09
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公开(公告)号： US06380588B1公开(公告)日： 2002-04-30
- 发明人: William G. En , Minh Van Ngo , Chih-Yuk Yang , David K. Foote , Scott A. Bell , Olov B. Karlsson , Christopher F. Lyons
- 申请人： William G. En , Minh Van Ngo , Chih-Yuk Yang , David K. Foote , Scott A. Bell , Olov B. Karlsson , Christopher F. Lyons
- 主分类号： H01L2100
- IPC分类号： H01L2100
摘要：
A semiconductor device having both functional and non-functional or dummy lines, regions and/or patterns to create a topology that causes the subsequently formed spacers to be more predictable and uniform in shape and size.