发明授权
US06386955B2 Carrier head with a flexible membrane for a chemical mechanical polishing system
有权
带有柔性膜的载体头，用于化学机械抛光系统
- 专利标题： Carrier head with a flexible membrane for a chemical mechanical polishing system
- 专利标题（中）： 带有柔性膜的载体头，用于化学机械抛光系统
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申请号： US09730944申请日： 2000-12-05
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公开(公告)号： US06386955B2公开(公告)日： 2002-05-14
- 发明人: Steven M. Zuniga , Manoocher Birang , Hung Chen , Sen-Hou Ko
- 申请人： Steven M. Zuniga , Manoocher Birang , Hung Chen , Sen-Hou Ko
- 主分类号： B24B100
- IPC分类号： B24B100
摘要：
A carrier head for a chemical mechanical polishing apparatus. The carrier head includes a housing, a base, a loading mechanism, a gimbal mechanism, and a substrate backing assembly. The substrate backing assembly includes a support structure positioned below the base, a substantially horizontal, annular flexure connecting the support structure to the base, and a flexible membrane connected to the support structure. The flexible membrane has a mounting surface for a substrate, and extends beneath the base to define a chamber.
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