利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

70 条记录 (耗时 0.027 秒)

    Carrier head with a flexible membrane for a chemical mechanical polishing system
    2.
    发明授权
    Carrier head with a flexible membrane for a chemical mechanical polishing system 有权
    带有柔性膜的载体头，用于化学机械抛光系统

    公开(公告)号：US06386955B2

    公开(公告)日：2002-05-14

    申请号：US09730944

    申请日：2000-12-05

    申请人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    发明人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    IPC分类号： B24B100

    CPC分类号： B24B37/30 ,  B24B37/32

    摘要： A carrier head for a chemical mechanical polishing apparatus. The carrier head includes a housing, a base, a loading mechanism, a gimbal mechanism, and a substrate backing assembly. The substrate backing assembly includes a support structure positioned below the base, a substantially horizontal, annular flexure connecting the support structure to the base, and a flexible membrane connected to the support structure. The flexible membrane has a mounting surface for a substrate, and extends beneath the base to define a chamber.

    摘要翻译： 用于化学机械抛光装置的载体头。 承载头包括壳体，基座，装载机构，万向节机构和基底背衬组件。 衬底背衬组件包括位于底座下方的支撑结构，将支撑结构连接到基座的基本水平的环形弯曲部，以及连接到支撑结构的柔性膜。 柔性膜具有用于基底的安装表面，并且在基底之下延伸以限定腔室。

    Carrier head with a flexible membrane
    3.
    发明授权
    Carrier head with a flexible membrane 失效
    带头的柔性膜

    公开(公告)号：US07040971B2

    公开(公告)日：2006-05-09

    申请号：US10946186

    申请日：2004-09-20

    申请人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    发明人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    IPC分类号： B24B1/00

    CPC分类号： B24B37/30 ,  B24B37/32

    摘要： A carrier head for a chemical mechanical polishing apparatus is described. The carrier head has a base, a rigid body, a membrane and a pressurizing structure. The rigid body is movable relative to the base and includes a downwardly-extending projection. The membrane has a mounting surface for a substrate. The membrane extends below the base to provide a chamber between the base and the membrane. The pressurizing structure applies a downward pressure on the rigid body to cause a lower surface of the rigid body to press on an inner surface of the membrane.

    摘要翻译： 描述了用于化学机械抛光装置的载体头。 承载头具有底座，刚体，膜和加压结构。 刚体相对于基座可移动并包括向下延伸的突出部。 膜具有用于基底的安装表面。 膜延伸到底部下方以在基底和膜之间提供腔室。 加压结构向刚体施加向下的压力，以使刚体的下表面压在膜的内表面上。

    Carrier head with a flexure
    4.
    发明授权
    Carrier head with a flexure 有权
    承载头弯曲

    公开(公告)号：US06857946B2

    公开(公告)日：2005-02-22

    申请号：US10353326

    申请日：2003-01-28

    申请人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    发明人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    IPC分类号： B24B37/30 ,  B24B37/32 ,  B24B49/16 ,  H01L21/304 ,  B24B1/00

    CPC分类号： B24B37/30 ,  B24B37/32

    摘要： A carrier head for a chemical mechanical polishing apparatus. The carrier head includes a housing, a base, a loading mechanism, a gimbal mechanism, and a substrate backing assembly. The substrate backing assembly includes a support structure positioned below the base, a substantially horizontal, annular flexure connecting the support structure to the base, and a flexible membrane connected to the support structure. The flexible membrane has a mounting surface for a substrate, and extends beneath the base to define a chamber.

    摘要翻译： 用于化学机械抛光装置的载体头。 承载头包括壳体，基座，装载机构，万向节机构和基底背衬组件。 衬底背衬组件包括位于底座下方的支撑结构，将支撑结构连接到基座的基本水平的环形弯曲部，以及连接到支撑结构的柔性膜。 柔性膜具有用于基底的安装表面，并且在基底之下延伸以限定腔室。

    Carrier head with a flexible membrane for a chemical mechanical polishing system
    5.
    发明授权
    Carrier head with a flexible membrane for a chemical mechanical polishing system 失效
    带有柔性膜的载体头，用于化学机械抛光系统

    公开(公告)号：US06183354B2

    公开(公告)日：2001-02-06

    申请号：US08861260

    申请日：1997-05-21

    申请人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    发明人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    IPC分类号： B24B500

    CPC分类号： B24B37/30 ,  B24B37/32

    摘要： A carrier head for a chemical mechanical polishing apparatus. The carrier head includes a housing, a base, a loading mechanism, a gimbal mechanism, and a substrate backing assembly. The substrate backing assembly includes a support structure positioned below the base, a substantially horizontal, annular flexure connecting the support structure to the base, and a flexible membrane connected to the support structure. The flexible membrane has a mounting surface for a substrate, and extends beneath the base to define a chamber.

    摘要翻译： 用于化学机械抛光装置的载体头。 承载头包括壳体，基座，装载机构，万向节机构和基底背衬组件。 衬底背衬组件包括位于底座下方的支撑结构，将支撑结构连接到基座的基本水平的环形弯曲部，以及连接到支撑结构的柔性膜。 柔性膜具有用于基底的安装表面，并且在基底之下延伸以限定腔室。

    Carrier head with a flexible membrane
    6.
    发明申请
    Carrier head with a flexible membrane 失效
    带头的柔性膜

    公开(公告)号：US20050037698A1

    公开(公告)日：2005-02-17

    申请号：US10946186

    申请日：2004-09-20

    申请人： Steven Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    发明人： Steven Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    IPC分类号： B24B37/30 ,  B24B37/32 ,  B24B49/16 ,  H01L21/304 ,  B24B1/00

    CPC分类号： B24B37/30 ,  B24B37/32

    摘要： A carrier head for a chemical mechanical polishing apparatus is described. The carrier head has a base, a rigid body, a membrane and a pressurizing structure. The rigid body is movable relative to the base and includes a downwardly-extending projection. The membrane has a mounting surface for a substrate. The membrane extends below the base to provide a chamber between the base and the membrane. The pressurizing structure applies a downward pressure on the rigid body to cause a lower surface of the rigid body to press on an inner surface of the membrane.

    摘要翻译： 描述了用于化学机械抛光装置的载体头。 承载头具有底座，刚体，膜和加压结构。 刚体相对于基座可移动并包括向下延伸的突出部。 膜具有用于基底的安装表面。 膜延伸到底部下方以在基底和膜之间提供腔室。 加压结构向刚体施加向下的压力，以使刚体的下表面压在膜的内表面上。

    Profile control platen
    7.
    发明申请
    Profile control platen 有权
    型材控制台板

    公开(公告)号：US20050186892A1

    公开(公告)日：2005-08-25

    申请号：US11029287

    申请日：2005-01-05

    申请人： Hung Chen ,  Steven Zuniga ,  Charles Garretson ,  Thomas Osterheld ,  Sen-Hou Ko ,  Mohsen Salek

    发明人： Hung Chen ,  Steven Zuniga ,  Charles Garretson ,  Thomas Osterheld ,  Sen-Hou Ko ,  Mohsen Salek

    IPC分类号： B24B37/16 ,  B24B41/047 ,  B24B1/00

    CPC分类号： B24B37/16

    摘要： A platen for chemical mechanical polishing of a substrate includes a surface upon which a polishing pad can be placed, a support structure, and a controller. The surface has a first region and a second region and is operable to exert force against the polishing pad during polishing. The support structure is located beneath the second region and is operable to cause the second region to exert more force than the first region. The controller is operable to adjust the amount of force that is exerted by the second region.

    摘要翻译： 用于基板的化学机械抛光的压板包括可以放置抛光垫的表面，支撑结构和控制器。 表面具有第一区域和第二区域，并且可操作以在抛光期间对抛光垫施加力。 支撑结构位于第二区域下方并且可操作以使第二区域施加比第一区域更多的力。 控制器可操作以调节由第二区域施加的力的量。