发明授权
- 专利标题： Method for patterning devices
- 专利标题（中）： 图案形成装置的方法
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申请号： US09723287申请日： 2000-11-28
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公开(公告)号： US06403392B1公开(公告)日： 2002-06-11
- 发明人: Paul E. Burrows , Stephen R. Forrest , Vladimir Bulovic , Peifang Tian , Julie Brown
- 申请人： Paul E. Burrows , Stephen R. Forrest , Vladimir Bulovic , Peifang Tian , Julie Brown
- 主分类号： H01L2100
- IPC分类号： H01L2100
摘要：
A method of fabricating a device is provided. A shadow mask is positioned in a first position over a substrate. A first process is performed on the substrate through the shadow mask. After the first process is performed, the shadow mask is moved to a second position over the substrate, measured relative to the first position. After the shadow mask is moved to the second position, a second process is performed on the substrate through the shadow mask.
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