发明授权
- 专利标题: Method and apparatus for drying substrate plates
- 专利标题(中): 干燥基板的方法和装置
-
申请号: US09780498申请日: 2001-02-12
-
公开(公告)号: US06421932B2公开(公告)日: 2002-07-23
- 发明人: Kazuhiko Gommori , Kazuto Kinoshita , Isamu Akiba , Masao Sugiyama
- 申请人: Kazuhiko Gommori , Kazuto Kinoshita , Isamu Akiba , Masao Sugiyama
- 优先权: JP12-034755 20000214; JP12-298615 20000929
- 主分类号: F26B300
- IPC分类号: F26B300
摘要:
While being transferred in substantially horizontal state along a predetermined path of transfer by a conveyer means, a substrate plate is dried by a jet of compressed air which is spurted out from a slit-like mouth of an air knife nozzle crosswise of the entire width of the substrate plate and at a predetermined angle of incidence with respect to a drying surface of the substrate plate to scrape off a liquid. The angle of incidence of jet air is made shallower as soon as the substrate on the conveyer means comes to a point of entry to an air blasting zone and is made deeper at latest when the substrate plate comes to a position immediately before a point of disengagement from the air blasting zone.
公开/授权文献
- US20010015021A1 Method and apparatus for drying substrate plates 公开/授权日:2001-08-23
信息查询