发明授权
- 专利标题: Workpiece holder for polishing, apparatus for polishing workpiece and method for polishing workpiece
- 专利标题(中): 用于抛光的工件架,抛光工件的设备和抛光工件的方法
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申请号: US09647505申请日: 2000-09-29
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公开(公告)号: US06422922B1公开(公告)日: 2002-07-23
- 发明人: Kouichi Okamura , Fumio Suzuki , Hisashi Masumura , Kouzi Morita , Naotaka Toyama
- 申请人: Kouichi Okamura , Fumio Suzuki , Hisashi Masumura , Kouzi Morita , Naotaka Toyama
- 优先权: JP11-33762 19990212
- 主分类号: B24B100
- IPC分类号: B24B100
摘要:
A workpiece holder for polishing comprising a workpiece holder body which is provided with multiple perforated holes for holding a workpiece by vacuum suction and a holder back plate which is closely contacted with a back face of the holder body and has grooves for vacuum, wherein the holder back plate is composed of a synthetic resin and has an Asker C hardness of 70 or higher but lower than 98, and an apparatus for polishing a workpiece and a method for polishing a workpiece utilizing it. By improving the material of holder back plate of a workpiece holder for polishing that holds a workpiece by vacuum suction to enhance sealing with the holder body, thereby developing such a holder back plate that should not transfer deformation of the holder body to the workpiece surface, even if polishing agent slurry is introduced and solidified, to provide a workpiece holder for polishing having a workpiece holding surface of high precision, an apparatus for polishing a workpiece and a method for polishing a workpiece.
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