公开(公告)号：US06386957B1

公开(公告)日：2002-05-14

申请号：US09581707

申请日：2000-06-16

申请人： Hisashi Masumura ,  Kouichi Tanaka ,  Fumio Suzuki ,  Kouzi Morita ,  Kouichi Okamura ,  Naotaka Toyama

发明人： Hisashi Masumura ,  Kouichi Tanaka ,  Fumio Suzuki ,  Kouzi Morita ,  Kouichi Okamura ,  Naotaka Toyama

IPC分类号： B24B100

CPC分类号： B24B37/30 ,  B05D1/32 ,  B05D3/042 ,  B24B7/00 ,  B25B11/005 ,  H01L21/6838

摘要： By improving the material of workpiece holder body of a workpiece holder for polishing that holds a workpiece by vacuum adsorption, and the material of resin film for coating a workpiece holding surface of the holder, and developing a method for coating the surface with a resin, which does not cause blocking of perforated holes of the holder body with the resin during the resin coating process, there are provided a workpiece holder for polishing having a workpiece holding surface of high precision, and a method for producing it. According to the present invention, there are provided a workpiece holder for polishing having a workpiece holder body provided with multiple perforated holes for holding a workpiece by vacuum adsorption, wherein a holding surface of the holder body is coated with a coating film formed by applying a thermosetting resin on the holding surface and curing it with heating, and a surface of the coating film is polished, and a method for producing it.

摘要翻译： 通过改善通过真空吸附保持工件的用于抛光的工件保持器的工件保持体的材料和用于涂覆保持件的工件保持表面的树脂膜的材料，并且开发用树脂涂覆表面的方法， 在树脂涂布过程中不会使树脂堵塞保持体的穿孔，提供了具有高精度的工件保持面的研磨用工件保持架及其制造方法。 根据本发明，提供了一种用于抛光的工件保持器，其具有设置有多个用于通过真空吸附保持工件的多孔的工件保持器本体，其中，保持器主体的保持表面涂覆有涂覆膜， 将热固性树脂固化在保持表面上并加热固化，并且对该涂膜的表面进行抛光及其制造方法。

公开(公告)号：US06422922B1

公开(公告)日：2002-07-23

申请号：US09647505

申请日：2000-09-29

申请人： Kouichi Okamura ,  Fumio Suzuki ,  Hisashi Masumura ,  Kouzi Morita ,  Naotaka Toyama

发明人： Kouichi Okamura ,  Fumio Suzuki ,  Hisashi Masumura ,  Kouzi Morita ,  Naotaka Toyama

IPC分类号： B24B100

CPC分类号： B24B37/30

摘要： A workpiece holder for polishing comprising a workpiece holder body which is provided with multiple perforated holes for holding a workpiece by vacuum suction and a holder back plate which is closely contacted with a back face of the holder body and has grooves for vacuum, wherein the holder back plate is composed of a synthetic resin and has an Asker C hardness of 70 or higher but lower than 98, and an apparatus for polishing a workpiece and a method for polishing a workpiece utilizing it. By improving the material of holder back plate of a workpiece holder for polishing that holds a workpiece by vacuum suction to enhance sealing with the holder body, thereby developing such a holder back plate that should not transfer deformation of the holder body to the workpiece surface, even if polishing agent slurry is introduced and solidified, to provide a workpiece holder for polishing having a workpiece holding surface of high precision, an apparatus for polishing a workpiece and a method for polishing a workpiece.

摘要翻译： 一种用于抛光的工件保持器，包括：工件保持器主体，其具有用于通过真空吸附保持工件的多个穿孔;以及保持器背板，其与保持器主体的背面紧密接触并具有用于真空的凹槽，其中， 背板由合成树脂构成，具有70以上且低于98的Asker C硬度，以及用于研磨工件的装置以及利用该工件抛光工件的方法。 通过改善用于通过真空抽吸保持工件的用于抛光的工件保持器的保持器背板的材料，以增强与保持体的密封性，从而显影不应该将保持器主体的变形转移到工件表面的保持器背板， 即使抛光剂浆料被引入和固化，也可提供具有高精度的工件保持表面的抛光用工件保持器，用于研磨工件的设备和抛光工件的方法。

公开(公告)号：US06769966B2

公开(公告)日：2004-08-03

申请号：US09979641

申请日：2001-11-26

申请人： Kouichi Okamura ,  Noboru Tamai ,  Kouzi Morita ,  Hisashi Masumura

发明人： Kouichi Okamura ,  Noboru Tamai ,  Kouzi Morita ,  Hisashi Masumura

IPC分类号： B24B722

CPC分类号： B24B37/30 ,  B24B49/14 ,  H01L21/6838

摘要： The present invention is a workpiece holder for polishing comprising at least a workpiece holder body having multiple perforated holes for holding a workpiece by vacuum adsorption and a back plate disposed on the back side of the body, which is provided with temperature controlling means or cooling means for the holder body. Thus, there is provided a workpiece holder for polishing, a polishing apparatus and a polishing method, which can provide a workpiece having good flatness by suppressing thermal deformation of the workpiece holder body and deformation of a resin film coated on the workpiece holding surface without degrading flatness of a workpiece held on the workpiece holder in the polishing of the workpiece, even when the number of polishing operation increases.

摘要翻译： 本发明是一种用于抛光的工件保持器，其至少包括具有多个用于通过真空吸附保持工件的多孔的工件保持器主体和设置在主体的背面上的背板，该背板设置有温度控制装置或冷却装置 为持有人身体。 因此，提供了用于抛光的工件保持器，抛光装置和抛光方法，其可以通过抑制工件保持体的热变形和涂覆在工件保持表面上的树脂膜的变形而提供具有良好平坦度的工件，而不会降低 即使当研磨次数增加时，工件保持在工件的抛光中的工件的平坦度。

公开(公告)号：US06399498B1

公开(公告)日：2002-06-04

申请号：US09244697

申请日：1999-02-04

申请人： Hisashi Masumura ,  Fumio Suzuki ,  Kouichi Okamura

发明人： Hisashi Masumura ,  Fumio Suzuki ,  Kouichi Okamura

IPC分类号： H01L21302

CPC分类号： B24B37/015

摘要： There is disclosed a method of processing a work comprising polishing a work holding surface 4a of a work holding plate 4 by contacting and rubbing a work holding surface 4a of a work holding plate 4 with a polishing pad 2 attached on a polishing turn table 1 with providing polishing agent 5 thereto, holding a wafer W on said work holding surface 4a by vacuum-holding, and contacting and rubbing the wafer W with said polishing pad 2 to polish the work with providing polishing agent 5 wherein temperature of the polishing agent 5 or the polishing turn table 1 is controlled by temperature controller 7,9 so that a temperature of said work holding surface 4a when polishing said work holding plate 4 and a temperature of said work holding surface 4a when polishing the wafer w are controlled to be the same. Degradation of flatness due to thermal influence when polishing the holding plate and polishing the wafer can be prevented in a method of processing comprising polishing the work holding surface of the work holding plate to conform with the deformed shape of the polishing pad, holding a work with the work holding surface, and polishing the work.

摘要翻译： 公开了一种处理工件的方法，其包括通过使工件保持板4的工件保持表面4a与安装在抛光台1上的抛光垫2接触和摩擦来抛光工件保持板4的工件保持表面4a， 向其提供抛光剂5，通过真空保持将晶片W保持在所述工件保持表面4a上，并且与抛光垫2接触并摩擦晶片W以抛光工件以提供抛光剂5，其中抛光剂5的温度或 抛光转台1由温度控制器7,9控制，使得当抛光所述工件保持板4时所述工件保持表面4a的温度和当研磨晶片w时所述工件保持表面4a的温度被控制为相同 。 可以防止在研磨保持板并抛光晶片时由于热影响而导致的平坦度的降低，包括：研磨工件保持板的工件保持表面以符合抛光垫的变形形状，保持工件 工作保持面，并抛光工作。

公开(公告)号：US06332830B1

公开(公告)日：2001-12-25

申请号：US09509208

申请日：2000-03-24

申请人： Kouichi Okamura ,  Fumio Suzuki ,  Hisashi Masumura

发明人： Kouichi Okamura ,  Fumio Suzuki ,  Hisashi Masumura

IPC分类号： B24B100

CPC分类号： B24B37/11 ,  B24B41/047 ,  B24D9/08

摘要： A polishing method and a polishing apparatus that are for making contact pressure between a work and a polishing pad substantially uniform within surfaces to obtain a work having good quality. A turn table (2) is supported by a grooved surface of a turn table receiving member (3b), the grooved surface being provided with grooves (9b) in a straight direction, a work (W) is pressed against a polishing pad (8) adhered to the turn table (2) while flowing polishing slurry, and a polishing is carried out by rotating the work (W) and the turn table (2).

摘要翻译： 一种用于使工件与抛光垫之间的接触压力在表面内基本均匀的抛光方法和抛光装置，以获得具有良好质量的工件。 转台（2）由转台接收构件（3b）的带槽表面支撑，开槽面在直线方向上设有槽（9b），工件（W）被压靠在抛光垫（8）上 ）在流动抛光浆料的同时粘附到转台（2），并且通过旋转工件（W）和转台（2）来进行抛光。

公开(公告)号：US20090289035A1

公开(公告)日：2009-11-26

申请号：US12534491

申请日：2009-08-03

申请人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

发明人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

IPC分类号： H01L21/3065 ,  C23C16/513

CPC分类号： H01J37/32504 ,  H01J37/32522 ,  H01J2237/022 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831

摘要： A plasma processing apparatus and method which includes a vacuum processing chamber, a plasma generating unit, a process gas supply unit, a specimen table, and a vacuum pumping unit. The specimen table includes an electrostatic arrangement for holding a specimen on a holding surface of the specimen table by electrostatic force, a specimen table cover arranged around the specimen table, and first and second heat transfer gas supply units. The first heat transfer gas supply unit has a main path for supplying a heat transfer gas to the specimen holding surface for cooling the specimen, and the second heat transfer gas supply unit has a branch path branched from the main path of the first heat transfer gas supply unit for supplying a part of the heat transfer gas to a gap between an outer portion of the specimen holding surface and the specimen table cover.

摘要翻译： 一种等离子体处理装置和方法，其包括真空处理室，等离子体产生单元，处理气体供应单元，样品台和真空泵送单元。 样本台包括用于通过静电力将样本保持在样品台的保持表面上的静电装置，设置在样本台周围的样本台盖以及第一和第二传热气体供应单元。 第一传热气体供给单元具有用于向试样保持面供给传热气体以冷却试样的主路径，第二传热气体供给单元具有从第一传热气体的主路径分支的分支路径 供应单元，用于将一部分传热气体供应到样品保持表面的外部与样品台盖之间的间隙。

公开(公告)号：US5355865A

公开(公告)日：1994-10-18

申请号：US87877

申请日：1993-07-09

申请人： Kouichi Okamura

发明人： Kouichi Okamura

IPC分类号： F02P7/073 ,  F02P5/00

CPC分类号： F02P7/073

摘要： A crankshaft angle sensor comprising a crankshaft angle sensing element (33) mounted to a housing (35) and a circuit board (37) mounted to the housing (35) and having an electronic circuit thereon. The electronic circuit is electrically connected to the crankshaft angle sensing element (33) for controlling an ignition timing of an internal combustion engine. The crankshaft angle sensing element (33) and the circuit board (37) are disposed in the direction substantially parallel to the axis of the distributor rotary shaft (31). The crankshaft angle sensing element (33) and the electronic circuit board (37) are electrically connected through a plurality of leads (33aa, 33bb, 38) and insert conductors (44, 54) having a parallel-gap-welded connection portion extending in a direction substantially perpendicular to the rotary shaft (31).

摘要翻译： 一种曲轴角度传感器，包括安装到壳体（35）的曲轴角度感测元件（33）和安装到所述壳体（35）并且在其上具有电子电路的电路板（37）。 电子电路电连接到用于控制内燃机的点火正时的曲轴角度感测元件（33）。 曲轴角度检测元件（33）和电路板（37）沿与分配器旋转轴（31）的轴线大致平行的方向设置。 曲轴角度检测元件（33）和电子电路板（37）通过多个引线（33aa，33bb，38）和插入导体（44,45）电连接，插入导体具有平行间隙焊接的连接部分 大致垂直于旋转轴（31）的方向。

公开(公告)号：US4943717A

公开(公告)日：1990-07-24

申请号：US413644

申请日：1989-09-28

申请人： Masayuki Ikeuchi ,  Kouichi Okamura

发明人： Masayuki Ikeuchi ,  Kouichi Okamura

IPC分类号： G01D5/36 ,  G01V8/12

CPC分类号： G01D5/36 ,  G01V8/12

摘要： An angle measuring device for measuring the turning angle of a crankshaft in an internal combustion engine in order to control, for example, the ignition timing thereof comprises: a rotating disc which is adapted to rotate in synchronization with a crankshaft and which has a plurality of slits formed along the circumference thereof; light-emitting elements arranged in the vicinity of the rotating disc; light-receiving elements adapted to receive light emitted from the light-emitting elements through the slits of the rotating disc; and a signal processing circuit adapted to process signals output from the light-receiving elements and including: a semiconductor substrate, a plurality of islands formed on the surface of the semiconductor substrate from diffusion layers, a protective-resistor element formed in one of the islands and connected to the light-emitting means, and separation layers separating the island on which the protective-resistor element is formed from the other islands, no other elements being formed on the island on which the protective-resistor element is formed.

摘要翻译： 一种用于测量内燃机中的曲轴的转角以便例如控制其点火正时的角度测量装置包括：旋转盘，其适于与曲轴同步地旋转，并且具有多个 沿其圆周形成的狭缝; 布置在旋转盘附近的发光元件; 光接收元件，适于通过旋转盘的狭缝接收从发光元件发射的光; 以及信号处理电路，适于处理从所述光接收元件输出的信号，并且包括：半导体衬底，从扩散层形成在所述半导体衬底的表面上的多个岛，形成在所述岛中的一个岛中的保护电阻元件 并且与发光装置连接，并且将形成有保护电阻元件的岛与其他岛分隔开的分离层，在形成有保护电阻元件的岛上没有其他元件形成。

公开(公告)号：US4449662A

公开(公告)日：1984-05-22

申请号：US406834

申请日：1982-08-10

申请人： Kouichi Okamura ,  Yukio Eriguchi ,  Katsushige Hagio ,  Setsuo Yamamoto

发明人： Kouichi Okamura ,  Yukio Eriguchi ,  Katsushige Hagio ,  Setsuo Yamamoto

IPC分类号： B65D5/00 ,  B65D5/42 ,  B65D5/44 ,  B65D6/26 ,  B65D6/24

CPC分类号： B65D5/4283 ,  B65D5/006 ,  B65D5/445 ,  Y10T403/725

摘要： A corner holder for use with a box of corrugated cardboard having a pair of slots in sidewalls thereof adjacent to a corner of the box, comprises a pair of inserts each including a tongue-shaped base plate and a U-shaped flange on the base plate, and a flexible connector web joined between the inserts. The base plate and the flange jointly define a channel or groove extending along opposite side edges and an arcuate bottom edge of the base plate. When the corner holder is installed on the box, the inserts are inserted in the slots, respectively, with edges of the sidewalls which define the slots being fitted in the grooves in the inserts. The corner of the box is thus clamped and reinforced by the corner holder. The box can readily be folded into a collapsed form simply by removing the inserts out of the slots.

摘要翻译： 一个用于与箱体相邻的侧壁中的一对槽的瓦楞纸箱一起使用的角架，包括一对插入件，每个插入件包括在基板上的舌形基板和U形凸缘 以及连接在插入件之间的柔性连接片。 底板和凸缘共同限定了一个通道或凹槽，该通道或凹槽沿相对的侧边缘和基板的弓形底部边缘延伸。 当角落架安装在箱体上时，插入件分别插入插槽中，侧壁边界限定槽插入插入槽中。 盒子的角部由夹具固定并加固。 通过将插入物从插槽中取出，该盒子可以容易地折叠成折叠形式。

公开(公告)号：US07208422B2

公开(公告)日：2007-04-24

申请号：US10953537

申请日：2004-09-30

申请人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

发明人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

IPC分类号： H01L21/302

CPC分类号： H01J37/32504 ,  H01J37/32522 ,  H01J2237/022 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831

摘要： A plasma processing method utilizing a plasma processing apparatus having a plasma generating unit, a process chamber including an outer cylinder for withstanding a reduced pressure, and an inner cylinder made of non-magnetic material and being replaceable arranged inside the outer cylinder, a process gas supply unit for supplying gas to the process chamber, a specimen table for holding a specimen and a vacuum pumping unit. A temperature of the inner cylinder is monitored, and a desired inner cylinder temperature which is inputted in advance in response to a processing condition of the specimen is compared with the monitored temperature of the inner cylinder. A temperature of the outer cylinder is controlled in response to a result of the comparison so as to control the inner cylinder temperature to a predetermined value.

摘要翻译： 一种利用等离子体处理装置的等离子体处理方法，该等离子体处理装置具有等离子体发生单元，具有用于承受减压的外筒的处理室，以及由非磁性材料制成的可更换的内筒， 用于向处理室供给气体的供给单元，用于保持试样的试样台和真空泵送单元。 监测内筒的温度，并将根据试样的加工条件预先输入的期望的内筒温度与内筒的监测温度进行比较。 响应于比较的结果来控制外筒的温度，以将内筒温度控制到预定值。