Workpiece holder for polishing, method for producing the same, method for polishing workpiece, and polishing apparatus
    1.
    发明授权
    Workpiece holder for polishing, method for producing the same, method for polishing workpiece, and polishing apparatus 失效
    用于抛光的工件支架,其制造方法,抛光工件的方法和抛光装置

    公开(公告)号:US06386957B1

    公开(公告)日:2002-05-14

    申请号:US09581707

    申请日:2000-06-16

    IPC分类号: B24B100

    摘要: By improving the material of workpiece holder body of a workpiece holder for polishing that holds a workpiece by vacuum adsorption, and the material of resin film for coating a workpiece holding surface of the holder, and developing a method for coating the surface with a resin, which does not cause blocking of perforated holes of the holder body with the resin during the resin coating process, there are provided a workpiece holder for polishing having a workpiece holding surface of high precision, and a method for producing it. According to the present invention, there are provided a workpiece holder for polishing having a workpiece holder body provided with multiple perforated holes for holding a workpiece by vacuum adsorption, wherein a holding surface of the holder body is coated with a coating film formed by applying a thermosetting resin on the holding surface and curing it with heating, and a surface of the coating film is polished, and a method for producing it.

    摘要翻译: 通过改善通过真空吸附保持工件的用于抛光的工件保持器的工件保持体的材料和用于涂覆保持件的工件保持表面的树脂膜的材料,并且开发用树脂涂覆表面的方法, 在树脂涂布过程中不会使树脂堵塞保持体的穿孔,提供了具有高精度的工件保持面的研磨用工件保持架及其制造方法。 根据本发明,提供了一种用于抛光的工件保持器,其具有设置有多个用于通过真空吸附保持工件的多孔的工件保持器本体,其中,保持器主体的保持表面涂覆有涂覆膜, 将热固性树脂固化在保持表面上并加热固化,并且对该涂膜的表面进行抛光及其制造方法。

    Workpiece holder for polishing, apparatus for polishing workpiece and method for polishing workpiece
    2.
    发明授权
    Workpiece holder for polishing, apparatus for polishing workpiece and method for polishing workpiece 失效
    用于抛光的工件架,抛光工件的设备和抛光工件的方法

    公开(公告)号:US06422922B1

    公开(公告)日:2002-07-23

    申请号:US09647505

    申请日:2000-09-29

    IPC分类号: B24B100

    CPC分类号: B24B37/30

    摘要: A workpiece holder for polishing comprising a workpiece holder body which is provided with multiple perforated holes for holding a workpiece by vacuum suction and a holder back plate which is closely contacted with a back face of the holder body and has grooves for vacuum, wherein the holder back plate is composed of a synthetic resin and has an Asker C hardness of 70 or higher but lower than 98, and an apparatus for polishing a workpiece and a method for polishing a workpiece utilizing it. By improving the material of holder back plate of a workpiece holder for polishing that holds a workpiece by vacuum suction to enhance sealing with the holder body, thereby developing such a holder back plate that should not transfer deformation of the holder body to the workpiece surface, even if polishing agent slurry is introduced and solidified, to provide a workpiece holder for polishing having a workpiece holding surface of high precision, an apparatus for polishing a workpiece and a method for polishing a workpiece.

    摘要翻译: 一种用于抛光的工件保持器,包括:工件保持器主体,其具有用于通过真空吸附保持工件的多个穿孔;以及保持器背板,其与保持器主体的背面紧密接触并具有用于真空的凹槽,其中, 背板由合成树脂构成,具有70以上且低于98的Asker C硬度,以及用于研磨工件的装置以及利用该工件抛光工件的方法。 通过改善用于通过真空抽吸保持工件的用于抛光的工件保持器的保持器背板的材料,以增强与保持体的密封性,从而显影不应该将保持器主体的变形转移到工件表面的保持器背板, 即使抛光剂浆料被引入和固化,也可提供具有高精度的工件保持表面的抛光用工件保持器,用于研磨工件的设备和抛光工件的方法。

    Polishing method and polishing device
    3.
    发明授权
    Polishing method and polishing device 有权
    抛光方法和抛光装置

    公开(公告)号:US06332830B1

    公开(公告)日:2001-12-25

    申请号:US09509208

    申请日:2000-03-24

    IPC分类号: B24B100

    CPC分类号: B24B37/11 B24B41/047 B24D9/08

    摘要: A polishing method and a polishing apparatus that are for making contact pressure between a work and a polishing pad substantially uniform within surfaces to obtain a work having good quality. A turn table (2) is supported by a grooved surface of a turn table receiving member (3b), the grooved surface being provided with grooves (9b) in a straight direction, a work (W) is pressed against a polishing pad (8) adhered to the turn table (2) while flowing polishing slurry, and a polishing is carried out by rotating the work (W) and the turn table (2).

    摘要翻译: 一种用于使工件与抛光垫之间的接触压力在表面内基本均匀的抛光方法和抛光装置,以获得具有良好质量的工件。 转台(2)由转台接收构件(3b)的带槽表面支撑,开槽面在直线方向上设有槽(9b),工件(W)被压靠在抛光垫(8)上 )在流动抛光浆料的同时粘附到转台(2),并且通过旋转工件(W)和转台(2)来进行抛光。

    Method and apparatus for polishing work
    4.
    发明授权
    Method and apparatus for polishing work 失效
    抛光工作的方法和装置

    公开(公告)号:US06399498B1

    公开(公告)日:2002-06-04

    申请号:US09244697

    申请日:1999-02-04

    IPC分类号: H01L21302

    CPC分类号: B24B37/015

    摘要: There is disclosed a method of processing a work comprising polishing a work holding surface 4a of a work holding plate 4 by contacting and rubbing a work holding surface 4a of a work holding plate 4 with a polishing pad 2 attached on a polishing turn table 1 with providing polishing agent 5 thereto, holding a wafer W on said work holding surface 4a by vacuum-holding, and contacting and rubbing the wafer W with said polishing pad 2 to polish the work with providing polishing agent 5 wherein temperature of the polishing agent 5 or the polishing turn table 1 is controlled by temperature controller 7,9 so that a temperature of said work holding surface 4a when polishing said work holding plate 4 and a temperature of said work holding surface 4a when polishing the wafer w are controlled to be the same. Degradation of flatness due to thermal influence when polishing the holding plate and polishing the wafer can be prevented in a method of processing comprising polishing the work holding surface of the work holding plate to conform with the deformed shape of the polishing pad, holding a work with the work holding surface, and polishing the work.

    摘要翻译: 公开了一种处理工件的方法,其包括通过使工件保持板4的工件保持表面4a与安装在抛光台1上的抛光垫2接触和摩擦来抛光工件保持板4的工件保持表面4a, 向其提供抛光剂5,通过真空保持将晶片W保持在所述工件保持表面4a上,并且与抛光垫2接触并摩擦晶片W以抛光工件以提供抛光剂5,其中抛光剂5的温度或 抛光转台1由温度控制器7,9控制,使得当抛光所述工件保持板4时所述工件保持表面4a的温度和当研磨晶片w时所述工件保持表面4a的温度被控制为相同 。 可以防止在研磨保持板并抛光晶片时由于热影响而导致的平坦度的降低,包括:研磨工件保持板的工件保持表面以符合抛光垫的变形形状,保持工件 工作保持面,并抛光工作。

    Workpiece holder for polishing, workpiece polishing apparatus and polishing method
    5.
    发明授权
    Workpiece holder for polishing, workpiece polishing apparatus and polishing method 失效
    用于抛光的工件支架,工件抛光装置和抛光方法

    公开(公告)号:US08268114B2

    公开(公告)日:2012-09-18

    申请号:US10490480

    申请日:2002-09-27

    CPC分类号: B24B37/30

    摘要: A workpiece holder for polishing includes a workpiece holder body having multiple perforated holes to hold a workpiece by vacuum suction. A holding surface of the workpiece holder body may be coated with resin. A coefficient of thermal expansion of the resin coating on the holding surface may be 1×10−5/K or less. The resin coating on the holding surface may be epoxy resin filled with silica particles.

    摘要翻译: 用于抛光的工件保持器包括具有多个穿孔的工件保持器主体,以通过真空抽吸来保持工件。 工件保持体的保持面可以涂布树脂。 保持表面上的树脂涂层的热膨胀系数可以为1×10-5 / K以下。 保持表面上的树脂涂层可以是填充有二氧化硅颗粒的环氧树脂。

    Confocal scanning microscope
    7.
    发明授权
    Confocal scanning microscope 有权
    共焦扫描显微镜

    公开(公告)号:US08310753B2

    公开(公告)日:2012-11-13

    申请号:US12632007

    申请日:2009-12-07

    IPC分类号: G02B21/00 G02B27/14

    摘要: A confocal scanning microscope including: an objective system (second objective lens 23 and objective lens 24) illuminating a sample SA with illumination light; a scanning mechanism 31 scanning the sample SA to obtain an intensity signal; and a scanning optical system 32 provided between the scanning mechanism and the objective system. The scanning optical system composed of, in order from the scanning mechanism side, a first positive lens group G1, a second negative lens group G2, and a third positive lens group G3. The third lens group has two chromatic aberration correction portions each formed by a positive lens and a negative lens or negative lens and positive lens. Glass materials are selected such that one performs chromatization and the other performs achromatization, thereby providing a confocal scanning microscope capable of correcting lateral chromatic aberration generated in the objective system in the specific wavelength region by the scanning optical system.

    摘要翻译: 一种共焦扫描显微镜,包括:用照明光照射样品SA的物镜系统(第二物镜23和物镜24) 扫描机构31扫描样本SA以获得强度信号; 以及设置在扫描机构和物镜系统之间的扫描光学系统32。 扫描光学系统按照扫描机构侧的顺序由第一正透镜组G1,第二负透镜组G2和第三正透镜组G3构成。 第三透镜组具有由正透镜和负透镜或负透镜和正透镜形成的两个色像差校正部。 选择玻璃材料,使得一个进行着色,另一个进行消色化,从而提供能够通过扫描光学系统校正在特定波长区域中的物镜系统中产生的横向色差的共焦扫描显微镜。

    RADIO COMMUNICATION SYSTEM, RECEIVER, AND TRANSMITTER
    8.
    发明申请
    RADIO COMMUNICATION SYSTEM, RECEIVER, AND TRANSMITTER 有权
    无线电通信系统,接收机和发射机

    公开(公告)号:US20110182371A1

    公开(公告)日:2011-07-28

    申请号:US12737629

    申请日:2009-07-30

    IPC分类号: H04L27/00

    摘要: Provided are a radio communication system, a receiver, and a transmitter, which are capable of reducing an operation time period of a reception circuit of the receiver and achieving reduction in power consumption even if there is a clock error between the transmitter and the receiver. In a case of a conventional method illustrated in FIG. 1(A), the receiver is operated earlier by a time period (Tm), to thereby achieve synchronization before the clock error of the receiver exceeds the time period (Tm). This requires an extended reception time period for achieving clock synchronization, which therefore prevents the receiver from reducing its power consumption. In view of this, according to the present invention, as illustrated in FIG. 1(B), a synchronization signal is continuously transmitted from the transmitter a plurality of times in a short period of time, and the receiver receives only one of the continuously-transmitted synchronization signals. With this, the receiver can achieve synchronization of a reference clock by starting a reception operation earlier only by a time period (Tm′) (Tm′≦Tm).

    摘要翻译: 提供一种无线电通信系统,接收机和发射机,其能够减少接收机的接收电路的操作时间段,并且即使在发射机和接收机之间存在时钟误差也能实现功率消耗的降低。 在图1所示的常规方法的情况下, 如图1(A)所示,接收机较早地运行时间(Tm),从而在接收机的时钟误差超过时间段(Tm)之前实现同步。 这需要用于实现时钟同步的扩展接收时间段,从而防止接收机降低其功耗。 鉴于此,根据本发明,如图1所示, 如图1(B)所示,在短时间内多次从发送器连续发送同步信号,接收机仅接收连续发送的同步信号之一。 由此,接收器可以通过仅通过时间段(Tm')(Tm'≦̸ Tm)开始接收操作来实现参考时钟的同步。

    FLUORESCENT-LAMP-TYPE LED LIGHTING DEVICE
    9.
    发明申请
    FLUORESCENT-LAMP-TYPE LED LIGHTING DEVICE 审中-公开
    荧光灯型LED灯具

    公开(公告)号:US20100176411A1

    公开(公告)日:2010-07-15

    申请号:US12667023

    申请日:2007-07-09

    申请人: Fumio Suzuki

    发明人: Fumio Suzuki

    IPC分类号: H01L33/00

    摘要: To provide a fluorescent-lamp-type LED lighting device that has a large amount of light intensity and that can replace a highly efficient existing lighting device, the fluorescent-lamp-type LED lighting device comprises an LED (3) comprising a thin plate-like semiconductor element body (31) that transmits light generated in a PN junction area (34) in the thickness direction and that emits the light from its surface, a surface electrode (32) arranged to cover the surface of the element body (31) and a plurality of cylindrical dielectric antennas (36) that penetrate the surface electrode (32) in its thickness direction and that condense the light transmitted through the inside of the semiconductor element body (31) and emit the light outside, and a lengthy exterior casing (2) made of resin having translucency. The LED (3) is arranged at both end parts of the exterior casing (2) or along its longitudinal direction. The light emitted from the LED (3) is irradiated outside through the exterior casing (2).

    摘要翻译: 为了提供具有大量光强度并且可以代替现有照明装置的荧光灯型LED照明装置,荧光灯型LED照明装置包括LED(3),LED(3) 所述半导体元件体(31)在所述厚度方向上透过在PN结区域(34)中产生的光并从其表面发射光;布置成覆盖所述元件体(31)的表面的表面电极(32) 以及多个在其厚度方向上穿透所述表面电极(32)的圆柱形介质天线(36),并且将透过所述半导体元件体(31)内部的光聚光并将所述光发射到外部,以及将长的外壳 (2)由具有半透明度的树脂制成。 LED(3)设置在外壳(2)的两端部或其纵向方向。 从LED(3)发出的光通过外壳(2)照射到外部。