发明授权
US06423174B1 Apparatus and insertless method for forming cavity substrates using coated membrane 失效
使用涂覆膜形成腔体衬底的装置和无插入方法

Apparatus and insertless method for forming cavity substrates using coated membrane
摘要:
The present invention relates generally to a new apparatus and method for forming cavities in semiconductor substrates without the necessity of using an insert. More particularly, the invention encompasses an apparatus and a method for fabricating cavities in semiconductor substrates wherein a coated membrane sheet is placed over the cavity prior to lamination and caused to conform to the contour of the cavity, thus preventing collapse of, or damage to, the cavity shelves during the lamination process. After the lamination process, the coated membrane is conveniently removed without causing damage to the cavity shelves or paste pull-outs.
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