发明授权
US06425816B1 Polishing pads and methods relating thereto 有权
抛光垫及其相关方法

Polishing pads and methods relating thereto
摘要:
Polishing pads are provided having a polishing surface formed from a material. The polishing surface has a topography produced by a thermoforming process. The topography consists of large and small features that facilitate the flow of polishing fluid and facilitate smoothing and planarizing.
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