发明授权
- 专利标题： Substrate retainer
- 专利标题（中）： 基板保持架
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申请号： US09080094申请日： 1998-05-15
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公开(公告)号： US06436228B1公开(公告)日： 2002-08-20
- 发明人: Steven M. Zuniga , Hung Chih Chen
- 申请人： Steven M. Zuniga , Hung Chih Chen
- 主分类号： C23F102
- IPC分类号： C23F102
摘要：
A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.
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