发明授权
- 专利标题： Process of cleaning semiconductor processing, handling and manufacturing equipment
- 专利标题（中）： 半导体加工，处理和制造设备的清洗工艺
-
申请号： US09893206申请日： 2001-06-27
-
公开(公告)号： US06454869B1公开(公告)日： 2002-09-24
- 发明人: John Michael Cotte , Dario L. Goldfarb , Kenneth John McCullough , Wayne Martin Moreau , Keith R. Pope , John P. Simons , Charles J. Taft
- 申请人： John Michael Cotte , Dario L. Goldfarb , Kenneth John McCullough , Wayne Martin Moreau , Keith R. Pope , John P. Simons , Charles J. Taft
- 主分类号： B08B304
- IPC分类号： B08B304
摘要：
A process of cleaning semiconductor processing, handling and manufacturing equipment in which such equipment is contacted with a cleaning effective amount of liquid or supercritical carbon dioxide.
信息查询
