公开(公告)号：US06398875B1

公开(公告)日：2002-06-04

申请号：US09893231

申请日：2001-06-27

申请人： John Michael Cotte ,  Dario L. Goldfarb ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Dario L. Goldfarb ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B304

CPC分类号： H01L21/02054 ,  H01L21/02063 ,  H01L21/67034 ,  Y10S134/902

摘要： A process of drying a semiconductor wafer which includes at least one microelectric structure disposed thereon which includes contacting a water-containing thin film-covered semiconductor wafer with a composition which includes liquid or supercritical carbon dioxide and a surfactant.

摘要翻译： 一种干燥包括设置在其上的至少一个微电结构的半导体晶片的工艺，其包括使含水薄膜覆盖的半导体晶片与包括液体或超临界二氧化碳和表面活性剂的组合物接触。

公开(公告)号：US07332436B2

公开(公告)日：2008-02-19

申请号：US10966301

申请日：2004-10-15

申请人： John Michael Cotte ,  Dario L. Goldfarb ,  Pamela Jones ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Dario L. Goldfarb ,  Pamela Jones ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： H01L21/302 ,  C09K13/00

CPC分类号： H01L21/02071 ,  B08B7/0021 ,  C11D7/08 ,  C11D7/265 ,  C11D7/28 ,  C11D7/50 ,  C11D11/0047 ,  H01L21/31116

摘要： A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.

摘要翻译： 包括液体或超临界二氧化碳和pKa小于约4的酸的组合物。该组合物用于从精密表面与精密表面接触的精密表面（例如半导体样品）中除去残余物的方法 在热力学条件下的组成与液体或超临界二氧化碳在液体或超临界状态下的保留一致。

公开(公告)号：US06838015B2

公开(公告)日：2005-01-04

申请号：US09945596

申请日：2001-09-04

申请人： John Michael Cotte ,  Dario L. Goldfarb ,  Pamela Jones ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Dario L. Goldfarb ,  Pamela Jones ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B7/00 ,  C11D7/08 ,  C11D7/26 ,  C11D7/28 ,  C11D7/50 ,  C11D11/00 ,  H01L21/02 ,  H01L21/311 ,  H01L21/3213 ,  C09K13/00 ,  C09K13/04 ,  C09K13/06 ,  H01L21/302 ,  H01L21/3065

CPC分类号： H01L21/02071 ,  B08B7/0021 ,  C11D7/08 ,  C11D7/265 ,  C11D7/28 ,  C11D7/50 ,  C11D11/0047 ,  H01L21/31116

摘要： A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.

公开(公告)号：US06454869B1

公开(公告)日：2002-09-24

申请号：US09893206

申请日：2001-06-27

申请人： John Michael Cotte ,  Dario L. Goldfarb ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Dario L. Goldfarb ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B304

CPC分类号： C11D3/3738 ,  B08B7/0021 ,  C11D1/004 ,  C11D3/18 ,  C11D3/245 ,  C11D11/0047 ,  G03F7/42 ,  H01L21/6704 ,  Y10S134/902

摘要： A process of cleaning semiconductor processing, handling and manufacturing equipment in which such equipment is contacted with a cleaning effective amount of liquid or supercritical carbon dioxide.

摘要翻译： 一种清洁半导体处理，处理和制造设备的方法，其中这种设备与清洁有效量的液体或超临界二氧化碳接触。

公开(公告)号：US06739346B2

公开(公告)日：2004-05-25

申请号：US10207509

申请日：2002-07-29

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B310

CPC分类号： B08B7/0021

摘要： A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.

摘要翻译： 用于在再循环或处理之前清洁过滤器的方法和设备。 在该方法和装置中，液体或超临界二氧化碳在二氧化碳保持在液体或超临界状态的条件下接触过滤器的堵塞孔。

公开(公告)号：US06890855B2

公开(公告)日：2005-05-10

申请号：US09893207

申请日：2001-06-27

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： H01L21/02 ,  H01L21/302

CPC分类号： H01L21/02101 ,  H01L21/02057

摘要： A process of removing residue from an etched precision surface. In this process the etched precision surface is contacted with a composition which includes liquid or supercritical carbon dioxide and a fluoride-generating species.

摘要翻译： 从蚀刻精密表面除去残留物的方法。 在该过程中，蚀刻的精密表面与包括液体或超临界二氧化碳和产生氟化物质的组合物接触。

公开(公告)号：US06683008B1

公开(公告)日：2004-01-27

申请号：US10299130

申请日：2002-11-19

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： H01L21302

CPC分类号： G03F7/426 ,  G03F7/422 ,  H01L21/31133

摘要： A process of removing photoresist, previously subjected to ion implantation, from the surface of a workpiece. The process involves contacting the workpiece with a composition which includes liquid or supercritical carbon dioxide and between about 2% and about 20% of an alkanol having the structural formula CxX2x+1OH, where X is fluorine, hydrogen or mixtures thereof; and x is an integer of 1 to 8, said percentages being by volume, based on the total weight of the composition.

摘要翻译： 从工件表面除去预先进行离子注入的光致抗蚀剂的工艺。 该方法包括使工件与包含液体或超临界二氧化碳的组合物和约2％至约20％的具有结构式CxX2x + 1OH的链烷醇接触，其中X为氟，氢或其混合物; 并且x是1至8的整数，所述百分比是基于组合物的总重量的体积。

公开(公告)号：US06653233B2

公开(公告)日：2003-11-25

申请号：US09893266

申请日：2001-06-27

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

IPC分类号： H01L2144

CPC分类号： H01L21/7684 ,  H01L21/02063

摘要： A process of providing a semiconductor device with electrical interconnection capability wherein a sacrificial material is introduced into topographical features of the semiconductor device prior to chemical mechanical polishing so that debris formed during chemical mechanical polishing is incapable of falling into topographical features present on the semiconductor device. The sacrificial material is thereupon removed by liquid or supercritical carbon dioxide.

公开(公告)号：US06457480B1

公开(公告)日：2002-10-01

申请号：US09893208

申请日：2001-06-27

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B900

CPC分类号： B08B7/0021

摘要： A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.

摘要翻译： 用于在再循环或处理之前清洁过滤器的方法和设备。 在该方法和装置中，液体或超临界二氧化碳在二氧化碳保持在液体或超临界状态的条件下接触过滤器的堵塞孔。

公开(公告)号：US20130210235A1

公开(公告)日：2013-08-15

申请号：US11866232

申请日：2007-10-02

申请人： John P. Simons ,  Kenneth J. McCullough ,  Wayne M. Moreau ,  John M. Cotte ,  Keith R. Pope ,  Charles J. Taft ,  Dario L. Goldfarb

发明人： John P. Simons ,  Kenneth J. McCullough ,  Wayne M. Moreau ,  John M. Cotte ,  Keith R. Pope ,  Charles J. Taft ,  Dario L. Goldfarb

IPC分类号： H01L21/02

CPC分类号： H01L21/02101 ,  B08B7/0021 ,  H01L21/67109 ,  H01L21/67248 ,  Y10S134/902

摘要： A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.