发明授权
- 专利标题: Method of forming diamond film and film-forming apparatus
- 专利标题(中): 形成金刚石膜和成膜装置的方法
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申请号: US09873620申请日: 2001-06-04
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公开(公告)号: US06458415B2公开(公告)日: 2002-10-01
- 发明人: Kiichi Meguro , Takashi Matsuura , Takahiro Imai
- 申请人: Kiichi Meguro , Takashi Matsuura , Takahiro Imai
- 优先权: JP2000-170739 20000607
- 主分类号: C23C1626
- IPC分类号: C23C1626
摘要:
A method and an apparatus form a diamond film from a microwave plasma by controlling a manufacturing condition based on a spectroscopic measurement of the plasma light emission to obtain a large area of a high-quality diamond film. In the method of forming a diamond film, a gas mixture of hydrocarbon gas and hydrogen gas is introduced into a reactor, where the gas mixture is excited by microwave energy which is also introduced into the reactor to generate a plasma, and the light emitted from the plasma is spectroscopically measured. Furthermore, a formation condition of the diamond film is controlled such that the spectrum of a carbon molecule (C2) falls within a predetermined range of requirement. A carbon molecule vibration temperature is determined from the spectrum, and the formation pressure, or the gas flow rate is controlled so that the determined vibration temperature falls within a specified range, especially 2000 to 2800 K.
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