发明授权
US06469338B2 Non-volatile semiconductor memory device and manufacturing method thereof 失效
非易失性半导体存储器件及其制造方法

  • 专利标题: Non-volatile semiconductor memory device and manufacturing method thereof
  • 专利标题(中): 非易失性半导体存储器件及其制造方法
  • 申请号: US09324808
    申请日: 1999-06-03
  • 公开(公告)号: US06469338B2
    公开(公告)日: 2002-10-22
  • 发明人: Kiyoteru KobayashiNaoki Tsuji
  • 申请人: Kiyoteru KobayashiNaoki Tsuji
  • 优先权: JP10-349833 19981209
  • 主分类号: H01L2994
  • IPC分类号: H01L2994
Non-volatile semiconductor memory device and manufacturing method thereof
摘要:
A non-volatile semiconductor memory device allowing accurate reading of data, having superior charge detection characteristic and high rewriting durability, and free of undesirable writing of a non-selected memory cell transistor is provided. A memory cell transistor 100b includes a silicon substrate 1 having a main surface, a plurality of strip shaped isolating oxide films 4a and 4b formed on the main surface 1b of silicon substrate 1 to continuously extend approximately along the direction, and strip shaped source and drain regions 5b and 6b formed on the main surface 1b of silicon substrate 1 to continuously extend approximately along the direction.
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