发明授权
- 专利标题: Non-volatile semiconductor memory device and manufacturing method thereof
- 专利标题(中): 非易失性半导体存储器件及其制造方法
-
申请号: US09324808申请日: 1999-06-03
-
公开(公告)号: US06469338B2公开(公告)日: 2002-10-22
- 发明人: Kiyoteru Kobayashi , Naoki Tsuji
- 申请人: Kiyoteru Kobayashi , Naoki Tsuji
- 优先权: JP10-349833 19981209
- 主分类号: H01L2994
- IPC分类号: H01L2994
摘要:
A non-volatile semiconductor memory device allowing accurate reading of data, having superior charge detection characteristic and high rewriting durability, and free of undesirable writing of a non-selected memory cell transistor is provided. A memory cell transistor 100b includes a silicon substrate 1 having a main surface, a plurality of strip shaped isolating oxide films 4a and 4b formed on the main surface 1b of silicon substrate 1 to continuously extend approximately along the direction, and strip shaped source and drain regions 5b and 6b formed on the main surface 1b of silicon substrate 1 to continuously extend approximately along the direction.
公开/授权文献
信息查询