Invention Grant
US06508878B2 GaN system compound semiconductor and method for growing crystal thereof
有权
GaN系化合物半导体及其生长晶体的方法
- Patent Title: GaN system compound semiconductor and method for growing crystal thereof
- Patent Title (中): GaN系化合物半导体及其生长晶体的方法
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Application No.: US09794615Application Date: 2001-02-28
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Publication No.: US06508878B2Publication Date: 2003-01-21
- Inventor: Chin Kyo Kim , Tae Kyung Yoo
- Applicant: Chin Kyo Kim , Tae Kyung Yoo
- Priority: KR98-43212 19981015
- Main IPC: C30B2516
- IPC: C30B2516

Abstract:
GaN system compound semiconductor and method for growing a crystal thereof, which can significantly reduce a concentration of crystalline defects caused by lattice mismatch by growing a GaN system compound semiconductor of GaN or InxGa1-xN by using InxAl1-xN crystal on a substrate as an intermediate buffer layer, the method including the steps of (1) providing a sapphire substrate, (2) growing an intermediate buffer layer of InxAl1-xN on the sapphire substrate, and (3) growing GaN or InxGa1-xN system compound semiconductor on the intermediate buffer layer.
Public/Granted literature
- US20010009134A1 GaN system compound semiconductor and method for growing crystal thereof Public/Granted day:2001-07-26
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