- 专利标题: Nonvolatile semiconductor memory
-
申请号: US09976317申请日: 2001-10-15
-
公开(公告)号: US06512253B2公开(公告)日: 2003-01-28
- 发明人: Hiroshi Watanabe , Hiroshi Nakamura , Kazuhiro Shimizu , Seiichi Aritome , Toshitake Yaegashi , Yuji Takeuchi , Kenichi Imamiya , Ken Takeuchi , Hideko Oodaira
- 申请人: Hiroshi Watanabe , Hiroshi Nakamura , Kazuhiro Shimizu , Seiichi Aritome , Toshitake Yaegashi , Yuji Takeuchi , Kenichi Imamiya , Ken Takeuchi , Hideko Oodaira
- 优先权: JP10-084379 19980330; JP10-258778 19980911
- 主分类号: H01L2710
- IPC分类号: H01L2710
摘要:
A select gate transistor has a select gate electrode composed of a first-level conductive layer and a second-level conductive layer. The first-level conductive layer has a plurality of contact areas. The second-level conductive layer has its portions removed that are located above the contact areas. Two adjacent select gate electrodes that are adjacent to each other in the column direction are arranged such that the contact areas of one select gate electrode are not opposed to the contact areas of the other select gate electrode. One select gate electrode has its first- and second-level conductive layers removed in their portions that are opposed to the contact areas of the other select gate electrode.
公开/授权文献
- US20020047138A1 Nonvolatile semiconductor memory 公开/授权日:2002-04-25
信息查询