发明授权
- 专利标题: Integrated full wavelength spectrometer for wafer processing
- 专利标题(中): 集成全波长光谱仪用于晶圆加工
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申请号: US09539312申请日: 2000-03-30
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公开(公告)号: US06526355B1公开(公告)日: 2003-02-25
- 发明人: Tuqiang Ni , Tuan Ngo , Chung-Ho Huang , Andrew Lui , Farro Kaveh
- 申请人: Tuqiang Ni , Tuan Ngo , Chung-Ho Huang , Andrew Lui , Farro Kaveh
- 主分类号: G06F1900
- IPC分类号: G06F1900
摘要:
A process chamber with a computer system that controls the process chamber is connected to one or more spectrometers. The spectrometers may be part of an interferometer or may be an optical emission spectrometer. The spectrometers may be CCD or photodiode arrays of 2,048 elements. An input board forms part of the computer system and is directly connected to the spectrometers. The input board provides data from the spectrometers to dual port memory, which is directly accessible to the CPU of the computer system. The use of a state machine and adder on the input board allows computation and placement of the data from the spectrometers on to the dual port memory, so that the CPU is not needed for such placement.
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