公开(公告)号：US06526355B1

公开(公告)日：2003-02-25

申请号：US09539312

申请日：2000-03-30

申请人： Tuqiang Ni ,  Tuan Ngo ,  Chung-Ho Huang ,  Andrew Lui ,  Farro Kaveh

发明人： Tuqiang Ni ,  Tuan Ngo ,  Chung-Ho Huang ,  Andrew Lui ,  Farro Kaveh

IPC分类号： G06F1900

CPC分类号： H01J37/32935 ,  G01N23/20 ,  H01J37/32972

摘要： A process chamber with a computer system that controls the process chamber is connected to one or more spectrometers. The spectrometers may be part of an interferometer or may be an optical emission spectrometer. The spectrometers may be CCD or photodiode arrays of 2,048 elements. An input board forms part of the computer system and is directly connected to the spectrometers. The input board provides data from the spectrometers to dual port memory, which is directly accessible to the CPU of the computer system. The use of a state machine and adder on the input board allows computation and placement of the data from the spectrometers on to the dual port memory, so that the CPU is not needed for such placement.

摘要翻译： 具有控制处理室的计算机系统的处理室连接到一个或多个光谱仪。 光谱仪可以是干涉仪的一部分，也可以是光发射光谱仪。 光谱仪可以是2,048个元件的CCD或光电二极管阵列。 输入板构成计算机系统的一部分，并直接连接到光谱仪。 输入板将数据从光谱仪提供给双端口存储器，可直接访问计算机系统的CPU。 在输入板上使用状态机和加法器允许将数据从光谱仪计算和放置到双端口存储器，以便CPU不需要这样的放置。

公开(公告)号：US06855567B1

公开(公告)日：2005-02-15

申请号：US09586530

申请日：2000-05-31

申请人： Tuqiang Ni ,  Andrew Lui ,  Chung-Ho Huang ,  Weinan Jiang

发明人： Tuqiang Ni ,  Andrew Lui ,  Chung-Ho Huang ,  Weinan Jiang

IPC分类号： H01J37/32 ,  H01L21/28 ,  H01L21/311 ,  H01L21/02

CPC分类号： H01J37/32935 ,  H01J37/32963 ,  H01L21/28035 ,  H01L21/31122

摘要： A method for determining an endpoint for etching a layer includes steps of estimating the etch endpoint and, during etch, directing radiant energy at two or more wavelengths onto the layer to be etched, detecting the last intensity maximum reflected at a first wavelength prior to the estimated etch endpoint, and detecting the intensity maximum reflected at a second wavelength first occurring after the last intensity maximum at the first wavelength. Also, a method for determining an endpoint for etching a layer having an approximate initial thickness by steps of, during etch, directing radiant energy at three or more wavelengths onto the layer to be etched; selecting first, second, and third wavelengths; approximating an etch rate from the time interval between a first detected intensity minimum and an adjacent intensity maximum reflected at the third wavelength, estimating an etch endpoint from the approximate initial thickness of the layer and the approximate etch rate; detecting the last intensity maximum reflected at the first wavelength prior to the estimated etch endpoint; and detecting the intensity maximum reflected at the second wavelength first occurring after the last intensity maximum at the first wavelength. The material making up the layer is at least partly transparent to both the first and the second wavelength. The first wavelength is longer than both the second wavelength and the third wavelength. In some embodiments the third wavelength is longer than the second wavelength. The endpoint is at the point of intensity maximum of the second wavelength or is at a point following an interval thereafter.

摘要翻译： 用于确定用于蚀刻层的端点的方法包括以下步骤：估计蚀刻端点，并且在蚀刻期间将两个或更多波长的辐射能引导到待蚀刻的层上，检测在第一波长之前反射的最后强度最大值 并且检测在第一波长的最后强度最大值之后首先出现的第二波长反射的强度最大值。 而且，一种用于确定用于蚀刻具有近似初始厚度的层的端点的方法，该蚀刻步骤在蚀刻期间将三个或更多个波长的辐射能引导到待蚀刻的层上; 选择第一，第二和第三波长; 从第一检测强度最小值和在第三波长反射的相邻强度最大值之间的时间间隔近似蚀刻速率，从该层的近似初始厚度估计蚀刻终点和近似蚀刻速率; 在估计的蚀刻端点之前检测在第一波长处反射的最后强度最大值; 并且检测在第一波长的最后强度最大值之后首先出现的第二波长反射的强度最大值。 构成该层的材料对于第一和第二波长至少部分透明。 第一波长比第二波长和第三波长长。 在一些实施例中，第三波长比第二波长长。 端点处于第二波长的强度最大点处，或者在其后的间隔处。

公开(公告)号：US07672747B2

公开(公告)日：2010-03-02

申请号：US11693664

申请日：2007-03-29

申请人： Chung-Ho Huang ,  Andrew Lui

发明人： Chung-Ho Huang ,  Andrew Lui

IPC分类号： G06F19/00 ,  G06F15/173

CPC分类号： G05B19/4183 ,  G05B2219/32097 ,  G05B2219/33063 ,  G05B2219/33068 ,  G05B2219/45031 ,  Y02P90/08 ,  Y02P90/10 ,  Y02P90/18 ,  Y02P90/20

摘要： A recipe-and component control module (RACCM) is provided. The RACCM is a server for performing data management in a plasma processing system with a plurality of components. The RACCM includes a plurality of intelligent agents. Each intelligent agent of the intelligent agents is configured to interact with each component of the plurality of components. The RACCM also includes a coordinating agent, which is configured to receive processed data from the plurality of intelligent agents.

摘要翻译： 提供配方和组件控制模块（RACCM）。 RACCM是用于在具有多个组件的等离子体处理系统中执行数据管理的服务器。 RACCM包括多个智能代理。 智能代理的每个智能代理被配置为与多个组件的每个组件进行交互。 RACCM还包括协调代理，其被配置为从多个智能代理接收处理的数据。

公开(公告)号：US08295963B2

公开(公告)日：2012-10-23

申请号：US12693267

申请日：2010-01-25

申请人： Chung-Ho Huang ,  Andrew Lui

发明人： Chung-Ho Huang ,  Andrew Lui

IPC分类号： G06F19/00 ,  G06F15/173

CPC分类号： G05B19/4183 ,  G05B2219/32097 ,  G05B2219/33063 ,  G05B2219/33068 ,  G05B2219/45031 ,  Y02P90/08 ,  Y02P90/10 ,  Y02P90/18 ,  Y02P90/20

摘要： A computer-implemented method for performing data management in a plasma processing system is provided. The method includes providing a recipe-and component control module (RACCM). The RACCM is a server that includes a plurality of intelligent agents, which are configured to interact with the plurality of components. The RACCM also includes a coordinating agent, which is configured to receive processed data from the plurality of intelligent agents. The RACCM further includes a set of provisional agents, which is configured to perform recipe management by distributing at least part of a recipe to at least one of the plurality of intelligent agents and the coordinating agent.

摘要翻译： 提供了一种用于在等离子体处理系统中执行数据管理的计算机实现的方法。 该方法包括提供配方和组件控制模块（RACCM）。 RACCM是包括多个智能代理的服务器，其被配置为与多个组件交互。 RACCM还包括协调代理，其被配置为从多个智能代理接收处理的数据。 RACCM还包括一组临时代理，其被配置为通过向至少一个智能代理和协调代理分配至少一部分食谱来执行配方管理。

公开(公告)号：US20080243988A1

公开(公告)日：2008-10-02

申请号：US11693664

申请日：2007-03-29

申请人： Chung-Ho Huang ,  Andrew Lui

发明人： Chung-Ho Huang ,  Andrew Lui

IPC分类号： G06F15/173

CPC分类号： G05B19/4183 ,  G05B2219/32097 ,  G05B2219/33063 ,  G05B2219/33068 ,  G05B2219/45031 ,  Y02P90/08 ,  Y02P90/10 ,  Y02P90/18 ,  Y02P90/20

摘要： A recipe-and component control module (RACCM) is provided. The RACCM is a server for performing data management in a plasma processing system with a plurality of components. The RACCM includes a plurality of intelligent agents. Each intelligent agent of the intelligent agents is configured to interact with each component of the plurality of components. The RACCM also includes a coordinating agent, which is configured to receive processed data from the plurality of intelligent agents.

摘要翻译： 提供配方和组件控制模块（RACCM）。 RACCM是用于在具有多个组件的等离子体处理系统中执行数据管理的服务器。 RACCM包括多个智能代理。 智能代理的每个智能代理被配置为与多个组件的每个组件进行交互。 RACCM还包括协调代理，其被配置为从多个智能代理接收处理的数据。

公开(公告)号：US20080244400A1

公开(公告)日：2008-10-02

申请号：US11693708

申请日：2007-03-29

申请人： Chung-Ho Huang ,  Robert Hefty ,  Andrew Lui ,  Dave Humbird ,  Charles Potter

发明人： Chung-Ho Huang ,  Robert Hefty ,  Andrew Lui ,  Dave Humbird ,  Charles Potter

IPC分类号： G06F3/048

CPC分类号： G05B19/41875 ,  G05B2219/31443 ,  G05B2219/32007 ,  G05B2219/32097 ,  G05B2219/45031 ,  H01L21/67276 ,  Y02P90/20 ,  Y02P90/22 ,  Y10S715/961

摘要： A computer-implemented method for performing recipe evaluation is provided. The computer-implemented method includes integrating a plurality of data sources into a single recipe report card framework. The recipe report card framework includes an editor for interacting with the plurality of data sources. The computer-implemented method also includes displaying a plurality of graphical displays. Each graphical display of the plurality of graphical displays is configured to present a signal parameter of a set of signal parameters for at least a substrate. The computer-implemented method further includes providing a plurality of criteria for each of the set of signal parameters. The computer-implemented method yet also includes providing a plurality of ranges for the each of the set of signal parameters. The computer-implemented method yet further includes providing an expert guide, which is configured to provide guidance in analyzing a recipe.

摘要翻译： 提供了一种用于执行配方评估的计算机实现的方法。 计算机实现的方法包括将多个数据源集成到单个配方报告卡框架中。 配方报告卡框架包括用于与多个数据源交互的编辑器。 计算机实现的方法还包括显示多个图形显示。 多个图形显示器的每个图形显示被配置为呈现用于至少一个基板的一组信号参数的信号参数。 计算机实现的方法还包括为该组信号参数中的每一个提供多个标准。 计算机实现的方法还包括为该组信号参数中的每一个提供多个范围。 计算机实现的方法还包括提供专家指南，其被配置为在分析食谱时提供指导。

公开(公告)号：US07356580B1

公开(公告)日：2008-04-08

申请号：US09539313

申请日：2000-03-30

申请人： Chung-Ho Huang ,  Andrew Lui ,  David J. Hemker

发明人： Chung-Ho Huang ,  Andrew Lui ,  David J. Hemker

IPC分类号： G06F15/173

CPC分类号： G06F13/4081

摘要： A process chamber with a computer system that controls the process chamber is connected to one or more sensors, which are used to monitor the process in the process chamber. The sensors are connected to the computer system in a client/server relationship, in a way that allows the sensors to be hot swappable plug and play sensors. The computer system exchanges various messages with the sensors, synchronizes with the sensors, and integrates and utilizes data sent from the sensors.

摘要翻译： 具有控制处理室的计算机系统的处理室连接到用于监视处理室中的处理的一个或多个传感器。 传感器以客户端/服务器的关系连接到计算机系统，使传感器能够热插拔即插即用的传感器。 计算机系统与传感器交换各种信息，与传感器同步，并集成和利用从传感器发送的数据。

公开(公告)号：US20100125360A1

公开(公告)日：2010-05-20

申请号：US12693267

申请日：2010-01-25

申请人： Chung-Ho Huang ,  Andrew Lui

发明人： Chung-Ho Huang ,  Andrew Lui

IPC分类号： G06F17/00 ,  G06F15/16

CPC分类号： G05B19/4183 ,  G05B2219/32097 ,  G05B2219/33063 ,  G05B2219/33068 ,  G05B2219/45031 ,  Y02P90/08 ,  Y02P90/10 ,  Y02P90/18 ,  Y02P90/20

摘要： A computer-implemented method for performing data management in a plasma processing system is provided. The method includes providing a recipe-and component control module (RACCM). The RACCM is a server that includes a plurality of intelligent agents, which are configured to interact with the plurality of components. The RACCM also includes a coordinating agent, which is configured to receive processed data from the plurality of intelligent agents. The RACCM further includes a set of provisional agents, which is configured to perform recipe management by distributing at least part of a recipe to at least one of the plurality of intelligent agents and the coordinating agent.

摘要翻译： 提供了一种用于在等离子体处理系统中执行数据管理的计算机实现的方法。 该方法包括提供配方和组件控制模块（RACCM）。 RACCM是包括多个智能代理的服务器，其被配置为与多个组件交互。 RACCM还包括协调代理，其被配置为从多个智能代理接收处理的数据。 RACCM还包括一组临时代理，其被配置为通过向至少一个智能代理和协调代理分配至少一部分食谱来执行配方管理。

公开(公告)号：US07558641B2

公开(公告)日：2009-07-07

申请号：US11693708

申请日：2007-03-29

申请人： Chung-Ho Huang ,  Robert Hefty ,  Andrew Lui ,  Dave Humbird ,  Charles Potter

发明人： Chung-Ho Huang ,  Robert Hefty ,  Andrew Lui ,  Dave Humbird ,  Charles Potter

IPC分类号： G06F19/00 ,  G05B13/02

CPC分类号： G05B19/41875 ,  G05B2219/31443 ,  G05B2219/32007 ,  G05B2219/32097 ,  G05B2219/45031 ,  H01L21/67276 ,  Y02P90/20 ,  Y02P90/22 ,  Y10S715/961

摘要： A computer-implemented method for performing recipe evaluation is provided. The computer-implemented method includes integrating a plurality of data sources into a single recipe report card framework. The recipe report card framework includes an editor for interacting with the plurality of data sources. The computer-implemented method also includes displaying a plurality of graphical displays. Each graphical display of the plurality of graphical displays is configured to present a signal parameter of a set of signal parameters for at least a substrate. The computer-implemented method further includes providing a plurality of criteria for each of the set of signal parameters. The computer-implemented method yet also includes providing a plurality of ranges for the each of the set of signal parameters. The computer-implemented method yet further includes providing an expert guide, which is configured to provide guidance in analyzing a recipe.

摘要翻译： 提供了一种用于执行配方评估的计算机实现的方法。 计算机实现的方法包括将多个数据源集成到单个配方报告卡框架中。 配方报告卡框架包括用于与多个数据源交互的编辑器。 计算机实现的方法还包括显示多个图形显示。 多个图形显示器的每个图形显示被配置为呈现用于至少一个基板的一组信号参数的信号参数。 计算机实现的方法还包括为该组信号参数中的每一个提供多个标准。 计算机实现的方法还包括为该组信号参数中的每一个提供多个范围。 计算机实现的方法还包括提供专家指南，其被配置为在分析食谱时提供指导。

公开(公告)号：US06815362B1

公开(公告)日：2004-11-09

申请号：US10138980

申请日：2002-05-03

申请人： Vincent Wong ,  Brett C. Richardson ,  Andrew Lui ,  Scott Baldwin

发明人： Vincent Wong ,  Brett C. Richardson ,  Andrew Lui ,  Scott Baldwin

IPC分类号： H01L21302

CPC分类号： H01J37/32862 ,  B08B7/0035 ,  C23C16/4405 ,  H01J37/32935

摘要： A method for determining an endpoint of an in-situ cleaning process of a semiconductor processing chamber is provided. The method initiates with providing an optical emission spectrometer (OES) configured to monitor selected wavelength signals. Then, baseline OES threshold signal intensities are determined for each of the selected wavelength signals. Next, an endpoint time of each step of the in-situ cleaning process is determined. Determining an endpoint time includes executing a process recipe to process a semiconductor substrate within the processing chamber. Executing the in-situ cleaning process and recording the endpoint time for each step of the in-situ cleaning process are also included in determining the endpoint time. Then, nominal operating times are established for each step of the in-situ cleaning process. A plasma processing system for executing a two step in-situ cleaning process is also provided.

摘要翻译： 提供了一种用于确定半导体处理室的原位清洁过程的端点的方法。 该方法通过提供被配置为监视所选波长信号的光发射光谱仪（OES）来启动。 然后，为每个所选择的波长信号确定基线OES阈值信号强度。 接下来，确定原位清洁过程的每个步骤的终点时间。 确定端点时间包括执行处理处理室内的半导体衬底的处理配方。 执行原位清洁过程并记录原位清洁过程的每个步骤的终点时间也包括在确定终点时间中。 然后，为原位清洗过程的每个步骤建立标称操作时间。 还提供了一种用于执行两步原位清洁处理的等离子体处理系统。