发明授权
US06537727B2 Resist composition comprising photosensitive polymer having loctone in its backbone
有权
抗蚀剂组合物包含其主链中具有洛酮的光敏聚合物
- 专利标题： Resist composition comprising photosensitive polymer having loctone in its backbone
- 专利标题（中）： 抗蚀剂组合物包含其主链中具有洛酮的光敏聚合物
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申请号： US09901569申请日： 2001-07-11
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公开(公告)号： US06537727B2公开(公告)日： 2003-03-25
- 发明人: Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
- 申请人： Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
- 优先权： KR2000-39562 20000711; KR2000-75485 20001212
- 主分类号： G03F7038
- IPC分类号： G03F7038
摘要：
A resist composition includes a photosensitive polymer having a lactone in its backbone. The photosensitive polymer of the resist composition includes at least one of the monomers having the formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x, y, v and w are independently integers from 1 to 6.
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