Invention Grant
- Patent Title: Ultra pure component purge system for gas discharge laser
- Patent Title (中): 用于气体放电激光的超纯组分清洗系统
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Application No.: US09771789Application Date: 2001-01-29
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Publication No.: US06539042B2Publication Date: 2003-03-25
- Inventor: Shahryar Rokni , Xiaojiang J. Pan , Eckehard D. Onkels
- Applicant: Shahryar Rokni , Xiaojiang J. Pan , Eckehard D. Onkels
- Main IPC: H01S322
- IPC: H01S322

Abstract:
The present invention provides an ultra pure purge system for discharge lasers. The LNP, the output coupler, the wavemeter and selected high voltage components are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is filtered and directed to each of the inlet ports. Gas exiting the outlet ports may be directed to flow monitors having alarms so that any loss of purge will be immediately detected. Purge gas may be exhausted or recirculated.
Public/Granted literature
- US20020105996A1 ULTRA PURE COMPONENT PURGE SYSTEM FOR GAS DISCHARGE LASER Public/Granted day:2002-08-08
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